三氟化氯电子气体研究进展  

Research progress of chlorine trifluoride electronic gas

作　　者：王连心 于剑昆 张景利 Wang Lianxin;Yu Jiankun;Zhang Jingli(Liming Research&Design Institute of Chemical Industry Co.,Ltd.,Luoyang 471000,China)

机构地区：[1]黎明化工研究设计院有限责任公司,河南洛阳471000

出　　处：《化学推进剂与高分子材料》2021年第3期21-31,共11页Chemical Propellants & Polymeric Materials

摘　　要：简要介绍了新型电子气体三氟化氯(ClF_(3))的发展历史及其物化性能,主要介绍了ClF_(3)的制备方法及其在电子工业中的应用,指出ClF_(3)作为一种新型含氟电子气体,可用于化学气相沉积反应室原位清洗,以替代传统上使用的全氟烃及在某些场合下替代NF_(3);ClF_(3)的高化学活性提高了其对半导体材料的蚀刻速率,在第三代半导体材料(如Si)中也具有应用前景。The development history of the novel electronic gas chlorine trifluoride(ClF_(3))and its physicochemical properties are briefly introduced.The preparation methods of ClF_(3) and its applications in the electronic industry are mainly introduced.It is pointed out that as a novel fluorine-containing electronic gas,ClF_(3) can be used for in-situ cleaning of the chemical vapor deposition reaction chamber to replace the traditional perfluorocarbons,and even NF_(3) in some cases.The high chemical reactivity of ClF_(3) improves the etching rate of the semiconductor materials,and it has also application prospect in the third generation semiconductor material(such as Si).

关 键 词：电子气体 三氟化氯 原位清洗 

分 类 号：TQ124.3[化学工程—无机化工]