基于仿真分析的设备微环境控制技术  

Micro-environment Control Method of Semiconductor Equipment Based on Simulation Analysis

作　　者：杨师[1] 史霄[1] 杨元元[1] 李龙飞 王洪宇[1] YANG Shi;SHI Xiao;YANG Yuanyuan;LI Longfei;WANG Hongyun(The 45th Research Institute of CETC,Beijing 100176,China)

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176

出　　处：《电子工业专用设备》2021年第3期8-11,共4页Equipment for Electronic Products Manufacturing

摘　　要：论述了一种基于仿真分析的半导体设备内部空间气流路径、紊流位置、各分区风压的闭环反馈系统及结构,目的在于使设备能够自动净化内部空间气体,防止颗粒凝结,从而达到控制并改善半导体设备内部微环境的目的。This paper introduces a closed-loop feedback system based on simulation analysis for air flow path,turbulence position and air pressure in the inner space of semiconductor equipment.The purpose is to make the equipment automatically purify the air in the inner space and prevent particles from condensation,in order to control and improve the internal micro-environment of semiconductor devices.

关 键 词：集成电路 芯片 微环境 CMP工艺 

分 类 号：TN305.2[电子电信—物理电子学]