沉积工艺对磁控溅射TiAlN薄膜微观形貌及性能的影响  

Influence of Deposition Process on Microstructure and Properties of Magnetron Sputtered TiAlN Films

作　　者：刘安强 袁建鹏 谢建刚 Liu Anqiang;Yuan Jianpeng;Xie Jiangang(BGRIMM Technology Group,Beijing 100160;Beijing Engineering Technology Research Center of Surface Strengthening and Repairing of Industry Parts,Beijing 102206;Beijing Key Laboratory of Special Coating Material and Technology,Beijing 102206)

机构地区：[1]矿冶科技集团有限公司,北京100160 [2]北京市工业部件表面强化与修复工程技术研究中心,北京102206 [3]特种涂层材料与技术北京市重点实验室,北京102206

出　　处：《热喷涂技术》2021年第1期33-42,21,共11页Thermal Spray Technology

摘　　要：采用非平衡磁控溅射技术在Q235钢基体上制备了TiAlN薄膜,研究了沉积工艺参数对薄膜微观形貌、力学性能及耐腐蚀性能的影响规律,通过扫描电镜、纳米力学探针、划痕测试仪对薄膜的微观形貌和力学性能进行表征,并利用盐雾试验和电化学极化测试研究了薄膜在含Cl-环境中的腐蚀行为。结果表明,随着N_(2)流量的升高,TiAlN薄膜的硬度和结合力先升高后降低,当N_(2)流量为10sccm时,薄膜具有最高的硬度和结合力,分别为30.7GPa和44.2N,其耐腐蚀性能最优。随着Al靶功率的增加,薄膜的硬度和结合力先增大后减小,当Al靶功率为90W时,薄膜的硬度和结合力达到了最大值,分别为28.6GPa和38.4N,具有最佳的抗腐蚀性能。随着基体温度的升高,薄膜的硬度和结合力逐渐增大,基体温度低于300℃时,增大幅度较明显,基体温度高于300℃时,二者增加幅度趋于平缓,薄膜表现出优异的耐腐蚀性能。TiAlN films were deposited on the surface of Q235 steel by unbalanced magnetron sputtering technology.The effects of deposition parameters on the morphology,mechanical properties and corrosion resistance of TiAlN films were studied.The microstructure and mechanical properties of the films were tested by scanning electron microscope,nanomechanical probe and scratch tester.The corrosion behavior of TiAlN films in the environment containing Cl-was investigated by salt spray test and electrochemical polarization test.The results showed that with the increase of N_(2) flow rate the hardness and bonding force of TiAlN films first increased and then decreased.When the N_(2) flow rate was 10 sccm,the film showed the highest hardness and bonding force,30.7 GPa and 44.2 N,respectively,and exhibited the best corrosion resistance.With the increase of Al target power,the hardness and bonding force of the film first increased and then decreased.When the Al target power was 90 W,the hardness and bonding force of the film reached the maximum,that was 28.6 GPa and 38.4 N,respectively,which exhibited best corrosion resistance.With the increase of the substrate temperature,the hardness and bonding force of the film gradually increased.When the substrate temperature was lower than 300℃,the increase of the hardness and bonding force was more obvious.When the substrate temperature was higher than 300℃,the increase range of the hardness and bonding force tended to be flat,and the film exhibited excellent corrosion resistance.

关 键 词：磁控溅射 TIALN薄膜 工艺参数 显微组织 耐腐蚀性 

分 类 号：TG174.4[金属学及工艺—金属表面处理]