磁控溅射基底温度对低矫顽力Fe-Si薄膜磁性能的影响  

Influence of substrate temperature on magnetic properties of low coercivity Fe-Si thin film

作　　者：李同奎 周春霞 严鹏飞 严彪[1,2] LI Tongkui;ZHOU Chunxia;YAN Pengfei;YAN Biao(School of Materials Science and Engineering,Tongji University,Shanghai 200000,China;Shanghai key Laboratory for D&A of Metal functional Materials,Shanghai 200000,China;School of Physics and Engineering,Tongji University,Shanghai 200000,China)

机构地区：[1]同济大学材料科学与工程学院,上海200000 [2]上海市金属功能材料开发应用重点实验室,上海200000 [3]同济大学物理科学与工程学院,上海200000

出　　处：《粉末冶金工业》2021年第3期32-38,共7页Powder Metallurgy Industry

摘　　要：本文采用直流磁控溅射法,在不同基地温度下溅射铁硅合金薄膜,获得低矫顽力软磁薄膜。基底温度升高,薄膜结晶度升高,内应力降低,矫顽力降低,当基底温度高于140℃时,基底中的Si向薄膜中扩散,薄膜磁矩被稀释,矫顽力升高,饱和磁化强度降低。VSM测试结果表明,薄膜矫顽力随基底温度升高先减小后增大,在基底温度140℃时溅射的Fe-Si薄膜的软磁性能较好,矫顽力Hc达到最低值1 Oe,饱和磁化强度Ms为716 emu/cm^(3)。初始磁化曲线表明,当外加磁场为20 Oe时,磁化强度为670 emu/cm^(3),磁化率为421.5。In this paper, Low coercivity soft magnetic films were obtained by DC magnetron sputtering at different temperatures. When the substrate temperature is higher than 140 ℃, Si in the substrate diffuses into the film,the magnetic moment of the film is diluted, the coercivity increases and the saturation magnetization decreases.The results of VSM show that the coercivity decreases first and then increases with the increase of substrate temperature. When the substrate temperature is 140 ℃, the soft magnetic properties of the sputtered Fe-Si films are better.The coercivity Hc reaches the lowest value of 1 Oe and the saturation magnetization Ms is 716 emu/cm^(3). The initial magnetization curve shows that when the applied magnetic field is 20 Oe, the magnetization is 670 emu/cm^(3) and the susceptibility is 421.5.

关 键 词：磁控溅射 Fe-Si薄膜 基底温度 磁性能 低矫顽力 

分 类 号：TB383.2[一般工业技术—材料科学与工程]