飞秒激光辅助刻蚀制备蓝宝石光栅(特邀)  

Fabrication of Sapphire Grating by Femtosecond Laser Assisted Etching(Invited)

作　　者：郑家鑫 高炳荣[2] 薛亚飞 罗子艺 韩善果 刘学青[2] 陈岐岱[2] ZHENG Jiaxin;GAO Bingrong;XUE Yafei;LUO Ziyi;HAN Shanguo;LIU Xueqing;CHEN Qidai(China-Ukraine Institute of Welding,Guangdong Academy of Sciences,China-Ukraine Belt and Road Joint Laboratory on Materials Joining and Advanced Manufacturing,Guangdong Provincial Key Laboratory of Advanced Welding Technology,Guangzhou 510650,China;State Key Laboratory of Integrated Optoelectronics,College of Electronic Science and Engineering,Jilin University,Changchun 130012,China)

机构地区：[1]广东省科学院中乌焊接研究所中国-乌克兰材料连接与先进制造"一带一路"联合实验室广东省现代焊接技术重点实验室,广州510650 [2]吉林大学电子科学与工程学院集成光电子国家重点实验室,长春130012

出　　处：《光子学报》2021年第6期84-90,共7页Acta Photonica Sinica

基　　金：国家重点研发计划(No.2017YFB1104600);广东省基础与应用基础研究基金(No.2019B1515120081);广东省科学院建设国内一流研究机构行动专项(No.2021GDASYL-20210103085)。

摘　　要：利用飞秒激光辅助刻蚀技术,在蓝宝石表面实现了周期、占空比及高度可调的光栅结构。解决了飞秒激光加工硬脆材料时表面质量较差、碎屑堆积导致的加工精度降低和难以制备深结构的问题。蓝宝石光栅结构的粗糙度从78 nm(激光直写后)降低到了7 nm(干法刻蚀后),实现了周期为800 nm光栅,以及深宽比为4的蓝宝石微结构的制备。飞秒激光辅助刻蚀技术能够制备蓝宝石表面高平滑光栅,并对光栅各级次衍射效率进行提升。By using femtosecond laser assisted etching technology,a grating structure with adjustable period,duty cycle and height is achieved on sapphire surface.It solves the problem of poor surface quality in femtosecond laser processing of hard and brittle materials,such as low processing accuracy caused by debris accumulation,and difficulty in preparing deep structures.The roughness of the sapphire grating structure was reduced from 78 nm(after direct laser writing)to 7 nm(after dry etching),and the sapphire microstructures with a period of 800 nm and a aspect ratio of 4 were fabricated.The femtosecond laser assisted etching technology can prepare a high smoothness grating on sapphire surface,and the result proves that this technology can significantly improve the diffraction efficiency of each diffraction order.

关 键 词：飞秒激光 蓝宝石 湿法刻蚀 干法刻蚀 光栅 

分 类 号：TN249[电子电信—物理电子学]