中频磁控溅射制备氧化钨薄膜及电致变色性能研究  

Study on Electrochromic Properties of Tungsten Oxide Films Deposited by Medium Frequency Magnetron Sputtering

作　　者：魏梦瑶 王辉 韩文芳 王红莉 苏一凡 唐春梅 代明江 石倩 WEI Meng-yao;WANG Hui;HAN Wen-fang;WANG Hong-li;SU Yi-fan;TANG Chun-mei;DAI Ming-jiang;SHI Qian(South China University of Technology,School of Materials Science and Engineering,Guangdong Key Laboratory of Advanced Energy Storage Materials,Guangzhou,510640;Guangdong Academy of Sciences,Guangdong Institute of New Materials,National Engineering Laboratory for Modern Surface Engineering Technology,Guangdong Key Laboratory of Modern Surface Engineering Technology,Guangzhou 510651,China)

机构地区：[1]华南理工大学,材料科学与工程学院,广东省先进储能材料重点实验室,广东广州510640 [2]广东省科学院新材料研究所,现代表面工程技术国家工程实验室,广东省现代表面工程技术重点实验室,广东广州510651

出　　处：《真空》2021年第5期50-56,共7页Vacuum

基　　金：广东特支计划资助(2019BT02C629);广东省自然科学基金团队项目(2016A030312015);广东省科学院科技创新发展专项(2018GDASCX-0402);广州市科技计划项目(202007020008)。

摘　　要：采用中频磁控溅射方法,在氧化铟(ITO)玻璃上采用氧化钨(WO_(3))陶瓷靶沉积薄膜,研究溅射气压对WO_(3)薄膜结构与光学性能的影响规律,并对其电致变色行为进行了探讨。采用X射线衍射(XRD)和扫描电子显微镜(SEM)分析了WO_(3)薄膜的成分结构和表面形貌,紫外可见分光光度计和电化学工作站对薄膜的光调制性能、电致变色伏安特性、以及循环寿命性能进行了研究,并利用X射线光电子能谱(XPS)对WO_(3)薄膜在着色、褪色状态下进行了化学成分及氧化状态分析。结果表明:随着溅射气压的增大,WO_(3)薄膜的形貌结构变得疏松、粗糙,更有利于Li+的注入与脱出,响应速度变快、调制幅度增大、电致变色性能优异,但循环寿命性能有所降低。当溅射气压为4Pa时WO_(3)薄膜的电致变色综合性能最好,在550nm处的调制幅度可达81.0%,着色、褪色响应时间分别为7.8s、5.85s,且在1500次循环后,仍保持较高的电致变色性能。The tungsten oxide(WO_(3))films on transparent conductive indium oxide glass were prepared by mid-frequency magnetron sputtering technique.The effect of sputtering pressure on the microstructure and optical properties of WO_(3) thin films was studied.The composition and surface morphology of WO_(3) films were analyzed by X-ray diffraction analysis and scanning electron microscopy.The electrochromic voltammetry,light modulation and cycle life of the WO_(3) films were studied by electrochemical workstation and UV-Vis spectrophotometer.The chemical composition and oxidation state of WO_(3) film in the state of coloring and bleaching were analyzed by X-ray photoelectron spectroscopy.The results show that the WO_(3) films are all amorphous.With the increase of sputtering pressure,the morphology of WO_(3) films structure becomes loose and rough,which is in favor of the intercalation/de-intercalation of Li+.The films deliver the fast response speed,wide amplitude modulation and excellent electrochromic performance,however,the poor cycling stability.When the sputtering pressure is 4 Pa,the best electrochromic properties with the modulation amplitude of 81.0%at 550 nm and coloring/bleaching response time of 7.8 s/5.85 s were obtained,which were well maintained after 1500 cycles.

关 键 词：WO_(3)薄膜 中频磁控溅射 电致变色 溅射气压 循环寿命 

分 类 号：TB34[一般工业技术—材料科学与工程] TB43