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作 者:杨芳儿 高蔓斌 张继 郑晓华 YANG Fanger;GAO Manbin;ZHANG Ji;ZHENG Xiaohua(College of Materials Science and Engineering,Zhejiang University of Technology,Hangzhou 310014,China;Zhejiang-California International Nanosystems Institute,Zhejiang University,Hangzhou 310058,China)
机构地区:[1]浙江工业大学材料科学与工程学院,杭州310014 [2]浙江加州国际纳米技术研究院,杭州310058
出 处:《硅酸盐学报》2021年第10期2154-2163,共10页Journal of The Chinese Ceramic Society
基 金:浙江省重点研发计划(2019C01088)。
摘 要:采用直流磁控溅射技术在Si基底上制备了不同CN_(x)层厚度的类金刚石(DLC)/N-梯度CN_(x)纳米多层膜(N含量梯度呈对称的倒"U"形)。利用X射线衍射仪、扫描电子显微镜、原子力显微镜、Raman光谱仪、X射线光电子能谱仪、划痕仪、球盘式摩擦磨损试验机等对多层膜的微观结构、力学性能以及真空和大气中的摩擦学特性等进行了表征。结果表明:多层膜表面平整光滑,均为非晶结构。随着对称N-梯度CN_(x)层厚度的增加,多层膜的表面粗糙度增大,硬度、弹性模量和膜基结合力逐渐降低,磨损率增加。多层膜在真空中的耐磨性比大气中的好。N-梯度CN_(x)层厚度小于30 nm的多层膜的硬度可达21.9~23.1 GPa,膜基结合力为54.2~54.3 N;在大气中的摩擦因数约为0.19,磨损率为(0.98~1.16)×10^(-16)m^(3)/(N·m),在真空中的摩擦因数约为0.18,磨损率为(0.83~0.88)×10^(-16) m^(3)/(N·m)。Diamond-like-carbon(DLC)/N-gradient CN_(x) nano-multilayer films with different thicknesses of nitrogen-content gradient CN_(x) layers were prepared on silicon substrate via direct-current magnetron sputtering,in which the nitrogen-content gradient appears in an inverted"U"shape.The microstructure,surface morphology,mechanical and tribological properties in vacuum and air were characterized by X-ray diffraction,scanning electron microscopy,atomic force microscopy,Raman spectroscopy,X-ray photoelectron spectroscopy,scratch testing and ball-on-disk wear tests.The results show that the surface of the multilayer films is smooth and all of them are amorphous.The hardness,elastic modulus,and adhesion of the multilayer films gradually decrease,and the surface roughness and wear rate increase with the increase of N-content gradient CN_(x) layer thickness.The wear resistance of the multilayer films is better in vacuum rather than in air.The multilayer film with a CN_(x) layer thickness of less than 30 nm exhibits a hardness in the range of 21.9-23.1 GPa,an interface adhesion in the range of 54.2-54.3 N,a friction coefficient of approximately 0.19 in air and 0.18 in vacuum,and a wear rate in the range of(0.98-1.16)×10^(-16) m^(3)/(N·m)in air and(0.83-0.88)×10^(-16)m^(3)/(N·m)in vacuum.
分 类 号:TG115.58[金属学及工艺—物理冶金]
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