月基极紫外相机Mo/Si多层膜反射镜的空间质子辐照稳定性  

Proton irradiation stability of Mo/Si multilayer mirror for Moon-based EUV camera

作　　者：李云鹏[1] 陈波[2] 吕鹏[3] 杨洪臣[1] 王华朋[1] LI Yunpeng;CHEN Bo;LV Peng;YANG Hongchen;WANG Huapeng(Criminal Investigation Police University of China,Shenyang 110854,China;Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China;Jiangsu University,Zhenjiang 212013,China)

机构地区：[1]中国刑事警察学院,沈阳110854 [2]中国科学院长春光学精密机械与物理研究所,长春130033 [3]江苏大学,江苏镇江212013

出　　处：《激光杂志》2021年第11期24-29,共6页Laser Journal

基　　金：国家重点研发计划项目(No.2017YFC0821000);辽宁省自然科学基金计划重点项目(No20180540048);中央高校基本科研业务费中国刑事警察学院项目(No.D2017020);辽宁省教育厅科学研究经费项目(No.ZGXJ2020008)。

摘　　要：为研究月基极紫外相机Mo/Si多层膜反射镜能否在月面辐照环境下长期稳定工作,从理论仿真、光学性能、微观形貌三方面对其辐照稳定性进行了研究。采用Monte-Carlo方法模拟了不同能量质子束辐照Mo/Si多层膜后薄膜内部的损伤情况,结果表明:质子能量越高,对薄膜深层损伤越大。进行了50KeV高能质子辐照实验,Mo/Si多层膜辐照后周期厚度降低、界面粗糙度增加,30.4 nm反射率下降2.8%,中心波长向短波方向偏移0.2nm。TEM显示Mo/Si多层膜辐照后出现了局部烧蚀和膜层间渗透,周期结构被破坏。制备的Mo/Si多层膜反射镜在辐照后虽然性能发生一定退化,但仍可正常工作,说明其具有良好的辐照稳定性。To study whether the Mo/Si multilayer mirror of lunar-based extreme ultraviolet(EUV)camera can work stably for a long time in the lunar radiation environment,the radiation stability of 30.4 nm Mo/Si multilayer was analyzed from the aspects of theoretical simulation,optical performance and morphology.Monte-Carlo technique was used to emulate the damage distribution in Mo/Si multilayer after proton irradiation with different energy in lunar surface,and the results show that the higher the proton energy is,the greater the damage in the deep layer of the film is.The Mo/Si multilayer film was irradiated by 50 KeV protons.After irradiation,the periodic thickness of Mo/Si multilayer film decreased,the interface roughness increased,the reflectivity at 30.4 nm decreased by 2.8%,and the central wavelength shifted by 0.2 nm to short wavelength.TEM shows that the Mo/Si multilayer film is partially ablated and infiltrated after irradiation,and the periodic structure is destroyed.The prepared Mo/Si multilayer mirror can still work normally after irradiation although the optical performance is degraded,which indicates that it has excellent irradiation stability.

关 键 词：MO/SI多层膜 质子辐照 反射率 等离子体层 

分 类 号：O434[机械工程—光学工程]