基于脉冲串模式的ZnO薄膜皮秒激光脉冲沉积技术  

Picosecond Pulsed Laser Deposition Technique to Fabricate Zinc-Oxide Thin Films Through Burst Mode

作　　者：吴恩利 代守军 轩新想[4] 何建国[1,2,3] 刘洋 谭羽 貊泽强[1,2,3] 余锦 WuEnli;Dai Shoujun;Xuan Xinxiang;He Jianguo;Liu Yang;Tan Yu;Mo Zeqiang;Yu Jin(Aerospace Information Research Institute,Chinese Academy of Sciences,Beijing 10009i,China;University of Chinese Academy of Sciences,Beijing 100049,China;Key Laboratory of Computational Optical Imaging Technology,Chinese Academy of Sciences,Beijing 100094,China;No.3 Research Institute,China Electronics Technology Group Corporation,Beijing 100015,China;Xi’an Institute of Optics and Precision Mechanics,Chinese Academy of Sciences,Xi’an,Shaanxi 710119,China)

机构地区：[1]中国科学院空天信息创新研究院,北京100094 [2]中国科学院大学,北京100049 [3]中国科学院计算光学成像技术重点实验室,北京100094 [4]中国电子科技集团公司第三研究所,北京100015 [5]中国科学院西安光学精密机械研究所,陕西西安710119

出　　处：《中国激光》2022年第6期31-42,共12页Chinese Journal of Lasers

基　　金：国家重点研发(2018YFB07400)、高端跨尺度多功能激光精密去除制造装备(2019ZDLGY01-04)、中国科学院科研仪器设备研制项目(YJKYYQ20200047)。

摘　　要：介绍了一种基于多脉冲模式的皮秒激光脉冲沉积方法,采用该方法在玻璃基底和单晶硅基底上沉积了透明导电氧化锌(ZnO)薄膜,使用光谱椭偏仪、原子力显微镜、扫描电子显微镜、X射线衍射仪、分光光度计和四探针测试仪分析了激光的不同脉冲串模式对ZnO薄膜厚度、粗糙度、表面形貌、晶体结构、光学性能以及电学性能的影响。结果表明:沉积速率随着子脉冲串数量的增加而减小;随着子脉冲串数量的增加,薄膜表面粗糙度减小,颗粒尺寸减小,薄膜变得更加致密光滑;所有样品均呈现多晶结构;ZnO薄膜的透过率在可见光区域内高于92.95%,且禁带宽度在3.317~3.427eV范围内;薄膜电阻率随着子脉冲数量的增加而减小。相比于单脉冲,利用多脉冲沉积产生的薄膜具有更高的表面质量、更好的光学性能和更低的电阻率。Objective Pulsed laser deposition(PLD)is a technique,for removing material from the surface of a target that uses laser energy pulses.It has several advantages over other depositions methods,including high particle energy to form film,fast deposition rate,and no restriction on the target materials.PLD technology has advanced rapidly in recent years,and it is now widely used in the production of metals,ceramics,transparent electrodes,and high-temperature superconducting films.For traditional PLD technology,nanosecond single-pulse lasers are commonly used as excitation sources.One disadvantage of using nanosecond pulsed laser is the possibility of selective ablation,which could result in a lack of stoichiometry during the process.This is a critical challenge that nanosecond PLD(ns-PLD)technologies for scientific research and industrial applications.With the increasing availability of commercial ultrashort laser sources,in recent years,and its distinct advantage of efficient laser ablation,the ultrashort pulse PLD is gaining popularity as a method for producing thin films.Ultrashort pulse PLD demonstrates its potential capacity to control the emission of droplets due to the diverse ablation mechanisms,even though it may not be the ultimate solution in smooth film deposition.Furthermore,the pulse sequence presented in this article has the potential to change the laser-matter interaction,which can be used to improve the deposit’s surface quality and optical properties.Methods A method for pulsed deposition of picosecond laser based on different pulse burst modes is presented,consisting of four main components:seed oscillator,pulse selector,laser amplifier,and power controller(Fig.1).The laser burst mode is set from 1to 4(Fig.2)with a 532nm output wavelength,100kHz laser frequency,33.3ns intrapulse interval,and 10μs interpulse string interval.Zinc oxide(ZnO)transparent conductive thin films are deposited on glass substrates and single-crystal silicon substrates via the proposed method.The effect of different pulse b

关 键 词：薄膜 脉冲激光沉积法 脉冲串模式 皮秒脉冲激光 氧化锌薄膜 

分 类 号：TN249[电子电信—物理电子学]