原子层沉积技术原理及在航天领域的应用现状  

The Characteristics of Atomic Layer Deposition Technology and its Application Status in Aerospace Field

作　　者：高恒蛟[1] 熊玉卿[1] 张文台[1] 张凯锋[1] 曹生珠[1] 成功 GAO Hengjiao;XIONG Yuqing;ZHANG Wentai;ZHANG Kaifeng;CAO Shengzhu;CHENG Gong(Science and Technology on Vacuum Technology and Physics Laboratory,Lanzhou Institute of Physics,Lanzhou 730010,China)

机构地区：[1]兰州空间技术物理研究所真空技术与物理重点实验室,兰州730010

出　　处：《真空科学与技术学报》2022年第4期237-243,共7页Chinese Journal of Vacuum Science and Technology

基　　金：甘肃省自然科学基金项目(20JR5RA082);国家自然科学基金项目(U1937601)。

摘　　要：原子层沉积(ALD)是一种高精度涂层制备的技术,薄膜膜厚可以实现原子水平的生长。该技术在薄膜厚度的控制、膜厚均匀性、复杂形状构件的覆盖程度等方面具有很大的优势,被认为是制备高致密度涂层非常有效的方法。本文通过对原子层沉积技术特征、关键技术问题和原子层沉积技术在航天相关领域应用的最新动态进行综述。针对原子层沉积技术反应温度窗口的确定和提高沉积速率两项关键技术,提出分别采用基于第一性原理的理论研究方法和空间原子层沉积技术(SALD)的技术路径,为原子层沉积技术在航天领域进一步发展和应用方向提供思路。Atomic layer deposition(ALD)is a kind of coating preparation technology with high precision that can realize the coating growth at the level of atomic thickness. ALD has great advantages in the coating thickness controlling,coating uniformity,coverage degree of complex structures,etc.,and is considered as a very effective preparation method of high-density coatings. In this paper,the characteristics,key technical problems,and the latest developments of ALD technology in the aerospace-related fields are reviewed. Aiming at the two key technologies of determination of reaction window temperature and the improvement of the deposition rate of ALD technology,the technical path of the theoretical research method based on the first principles and the space atomic layer deposition technology(SALD)are proposed,respectively,which provide ideas for the further development and application of ALD technology in the aerospace field.

关 键 词：原子层沉积 涂层厚度 高致密度 温度窗口 沉积速率 

分 类 号：TB43[一般工业技术]