Ti-Zr-V吸气剂薄膜在管道的制备与真空性能研究  

Vacuum performance of Ti-Zr-V getter films deposited on narrow tubes

作　　者：朱邦乐 范乐[1] 洪远志[1] 王思慧 尉伟[1] 王一刚 方键威 王勇[1] Zhu Bangle;Fan Le;Hong Yuanzhi;Wang Sihui;Wei Wei;Wang Yigang;Fang Jianwei;Wang Yong(National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230026,China)

机构地区：[1]中国科学技术大学国家同步辐射实验室,合肥230026

出　　处：《强激光与粒子束》2022年第6期78-83,共6页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(11975226,11905219)。

摘　　要：利用直流磁控溅射方法在单晶硅片和内径为22 mm、长度分别为500 mm和1500 mm的银铜管道内壁镀制了Ti-Zr-V非蒸散型吸气剂薄膜,并对镀膜管道的极限真空进行了测量。结果显示:在180℃下激活24 h后,镀制了Ti-Zr-V薄膜真空管道的极限真空度可以达到9.2×10^(−10) Pa。在关闭测试系统和离子泵的阀门后,系统仅依靠Ti-Zr-V薄膜的吸气依然能够维持在9×10^(−9) Pa很长时间。利用测试粒子蒙特卡罗法对薄膜的抽速和容量进行了分析和测量,结果显示,Ti-Zr-V薄膜对CO的初始粘附系数最大可以达到0.3,容量可以达到1.2个分子层。Non-evaporable getter films are widely used in particle accelerators.It has become an integral part of many particle accelerators.Ti-Zr-V films were deposited on Si substrates and straight and bent Ag-Cu tubes with an inner diameter of 22 mm by DC magnetron sputtering.After baked at 180℃for 24 h,the ultimate vacuum of the coated tubes reached 9.2×10^(−10) Pa.The tubes with activated getter films maintained at 9×10^(−9) Pa after closing tubes and ion pump valve.The pumping speed and capacity of Ti-Zr-V films were measured by Test Particle Monte Carlo method.The results show that the best CO sticking probability reaches 0.3,with a pumping capacity of 1.2 monolayer.

关 键 词：Ti-Zr-V薄膜 极限真空 磁控溅射 非蒸散型吸气剂薄膜 抽速测量 

分 类 号：TB79[一般工业技术—真空技术]