先进计算光刻  

Advanced Computational Lithography

作　　者：袁淼 孙义钰 李艳秋[1] Yuan Miao;Sun Yiyu;Li Yanqiu(School of Optics and Photonics,Beijing Institute of Technology,Beijing 100081,China)

机构地区：[1]北京理工大学光电学院,北京100081

出　　处：《激光与光电子学进展》2022年第9期161-176,共16页Laser & Optoelectronics Progress

基　　金：国家自然科学基金(62175014);国家科技重大专项(2017ZX02101006)。

摘　　要：计算光刻是极大规模集成电路(IC)制造的核心技术之一。随着IC节点的不断下移,对于工艺的要求越来越严苛。计算光刻技术对推进光刻工艺进步做出了巨大贡献。然而,尽管计算机技术的发展为计算光刻技术的进步提供了有力的支持,但是计算光刻速度和精度之间互制的难题,考虑光刻系统、掩模、工艺误差情况下的计算光刻研究,仍需要学术团队与工业研发团队协同攻关。在简单回顾计算光刻的重要里程碑节点的基础上,重点概述作者团队在“先进计算光刻:快速、高稳定计算光刻”的研究进展,包括矢量计算光刻、快速计算光刻和多目标-高稳定矢量计算光刻。最后,对未来计算光刻技术的发展做出了展望,并期望本文能对我国集成电路领域的研发人员和工程师有所帮助。Computational lithography is a core technology in manufacturing very large-scale integrated circuits(IC).The requirements for the lithography process are increasing rapidly with a decrease in the IC technology node.Computational lithography technology contributes considerably toward several advancements of the lithography process under the limitation of the hardware technology in lithography tools.The development of computer science provides strong support for computational lithography.However,the balance between speed and accuracy of computational lithography and computational lithography research considering lithography systems,masks,and process errors still require the collaboration of academic and industrial research and development teams.Based on a brief review of important milestones in computational lithography,we focused on an overview of the author team’s research progress in“advanced computational lithography:fast,robustness computational lithography”,including vectorial computational lithography,fast computational lithography,and multiobjective-robustness computational lithography.Finally,we present the future development of computational lithography technology,and hope that this review will help the researchers and engineers in the IC field.

关 键 词：光刻 计算成像 逆向光刻 计算光刻 分辨率增强技术 

分 类 号：TN305.7[电子电信—物理电子学]