用于芯片电容精确测量的在片开路方法研究  

Research on On-wafer Open Method for Chip Capacitance Measurement

作　　者：李灏 乔玉娥[1] 丁晨[1] 丁立强[1] 刘霞美 吴爱华[1] LI Hao;QIAO Yu-e;DING Chen;DING Li-qiang;LIU Xia-mei;WU Ai-hua(The 13th Research Institute of China Electronics Technology Group Corporation,Shijiazhuang,Hebei 050051,China)

机构地区：[1]中国电子科技集团公司第十三研究所,河北石家庄050051

出　　处：《计量学报》2022年第5期657-661,共5页Acta Metrologica Sinica

摘　　要：为实现芯片电容参数测量过程中的有效开路,提高在片电容测量的准确性及一致性,针对在片电容开路方法开展了研究工作。通过对标准电容器及开路器原理结构进行分析,结合半导体芯片工艺测试实际需求,设计并制作了在片开路器。在完成在片电容测试系统搭建基础上,分别利用传统悬空开路法和在片开路法对1 pF量值的在片电容进行了测量。实验数据显示,同悬空开路法相比,在片开路法电容测量结果的准确性及一致性有显著提升,测量重复性可达0.01%,为芯片电容计量测试工作提供了有效开路手段。To achieve the effective open operation during the chip capacitance measurement,and enhance the veracity and coherence of the results,the on-wafer open method was researched.By analyzing the principle and structure of the standard capacitor and open termination,combined with the actual needs of semiconductor technical measurement,the on-wafer open instrument was designed and manufactured.Based on constructing the on-wafer capacitance test system,measurements on 1 pF chip capacitance were conducted using traditional hanging open method and on-wafer open method.Results show that,compared with hanging open method,the on-wafer open method improves the veracity and coherence of test data,while the measuring repeatability achieves 0.01%,which offers an effective open method for chip capacitance metrology and measurement.

关 键 词：计量学 片上电容测量 开路器 标准电容 芯片测试 

分 类 号：TB971[一般工业技术—计量学]