SiC基底HFCVD金刚石薄膜摩擦磨损性能  

Wear properties of HFCVD diamond films on SiC substrate

作　　者：王贺 沈建辉[1,2] 刘鲁生 闫广宇[1,2] 吴玉厚 熊家骥[3] DANIEL Cristea WANG He;SHEN Jianhui;LIU Lusheng;YAN Guangyu;WU Yuhou;XIONG Jiaji;DANIEL Cristea(Joint International Research Laboratory of Modern Construction Engineering Equipment and Technology,Shenyang 110168,China;College of Mechanical Engineering,Shenyang Jianzhu University,Shenyang 110168,China;Shenyang National Laboratory for Materials Science,Institute of Metal Research,Chinese Academy of Sciences,Shenyang 110016,China;Materials Science and Engineering Faculty,Transilvania University of Brasov,Brasov 500036,Romania)

机构地区：[1]现代建筑工程装备与技术国际合作联合实验室,沈阳110168 [2]沈阳建筑大学机械工程学院,沈阳110168 [3]中国科学院金属研究所,沈阳材料科学国家研究中心,沈阳110016 [4]布拉索夫特兰西瓦尼亚大学材料科学与工程学院,布拉索夫500036,罗马尼亚

出　　处：《金刚石与磨料磨具工程》2022年第3期283-289,共7页Diamond & Abrasives Engineering

基　　金：国家自然科学基金(51942507);学科创新引智项目(D18017);沈阳市科技局(18-400-6-05);中央军委科技委项目(20-163-00-TS-006-002-11);福建省-中科院STS计划配套项目(2020T3001)。

摘　　要：利用热丝化学气相沉积技术在碳化硅基底上制备微米金刚石薄膜、纳米金刚石薄膜和金刚石–石墨复合薄膜,采用扫描电子显微镜、原子力显微镜和拉曼光谱仪对不同金刚石薄膜的表面形貌和微观结构进行表征,通过摩擦磨损实验测试金刚石薄膜的摩擦系数并计算其磨损率,对比研究不同种类金刚石薄膜的摩擦磨损性能。结果表明:金刚石–石墨复合薄膜具有较好的摩擦磨损性能,薄膜表面粗糙度为53.8 nm,摩擦系数为0.040,和纳米金刚石薄膜(0.037)相当;金刚石–石墨复合薄膜的磨损率最低,为2.07×10^(−7)mm^(3)·N^(−1)·m^(−1)。在相同实验条件下,同碳化硅基底的磨损率(9.89×10^(−5)mm^(3)·N^(−1)·m^(−1))和摩擦系数(0.580)相比,所有金刚石薄膜的磨损率和摩擦系数均有明显提升,说明在SiC基体表面沉积金刚石薄膜能够显著提高碳化硅材料在摩擦学领域的使役性能。Micro-diamond film,nano-diamond film and diamond-graphite composite film were deposited on silicon carbide substrate by hot filament chemical vapor deposition.The surface morphology and phase of the grown diamond films were analyzed using scanning electron microscope,atomic force microscope and Raman spectrometer.The friction coefficient and the wear rate of diamond films were measured by friction experiments.The friction and wear properties of diamond films were studied by comparing the experimental results.The results show that the diamond-graphite composite film has better friction and wear properties,the surface roughness of which is 53.8 nm.The friction coefficient(0.040)is similar to that of the nano-diamond film(0.037),while the wear rate is the lowest,2.07×10^(−7)mm^(3)·N^(−1)·m^(−1).Compared with those of SiC substrate,the wear rate(9.89×10^(−5)mm^(3)·N^(−1)·m^(−1))and the friction coefficient(0.580)of the diamond films have been greatly improved,which indicates that depositing diamond on the surface of SiC substrate significantly improves the performance of the silicon carbide in the field of friction.

关 键 词：金刚石薄膜 碳化硅 石墨 摩擦磨损 化学气相沉积 

分 类 号：TQ174.1[化学工程—陶瓷工业]