辉光放电等离子体与淀粉的相互作用  被引量:1

Interaction Between Glow Discharge Plasma and Starch

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作  者:刘培玲[1] 侯梦醒 王超 Liu Peiling;Hou Mengxing;Wang Chao(Department of Chemical Engineering,Inner Mongolia University of Technology,Hohhot 010051)

机构地区:[1]内蒙古工业大学化工学院,呼和浩特010051

出  处:《中国食品学报》2022年第6期344-357,共14页Journal of Chinese Institute Of Food Science and Technology

基  金:国家自然科学基金项目(21466027);内蒙古自然科学基金项目(2018MS02017)。

摘  要:综述辉光放电等离子体对淀粉蚀刻、氧化、交联及解聚的作用机理;归纳辉光放电等离子体的技术参数,包括气体种类、生成方式、处理功率及处理时间的变化对淀粉结构及性质的影响。淀粉的结构变化归纳为颗粒结构、结晶类型、层状结构及链支比例,理化性质的变化归纳为淀粉的糊化性质、流变性、焓热变化、酸度及溶解性等。最后,该文综述了辉光放电等离子体处理的淀粉在食品、包装及材料工业领域中的应用,并展望了今后亟需开展的研究方向和亟待解决的科学问题,为未来的辉光放电等离子体在淀粉领域的深入研究指明研究方向。The mechanism of glow discharge plasma on starch etching,oxidation,crosslinking and depolymerization was reviewed;The effect of technical parameters of glow discharge plasma,including the effects of gas type,generation mode,treatment power and treatment time on the structure and properties of starch was summarized.In this paper,the granular structure,crystal type,layered structure and the proportion of amylose and amylopectin of starch are summarized as structural changes,while the gelatinization property,rheology,enthalpy and heat change,acidity and solubility of starch are summarized as physical and chemical property changes.Finally,the applications of glow discharge plasma treated starch in the fields of food,packaging and materials industry were summarized,and the research directions and scientific problems to be solved in the future were prospected,which pointed out the research direction for the further research of glow discharge plasma in the field of starch in the future.

关 键 词:淀粉 辉光放电 低温等离子体 改性 相互作用 

分 类 号:TS231[轻工技术与工程—粮食、油脂及植物蛋白工程]

 

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