β-环糊精制备光刻胶成膜树脂及性能研究  

Preparation and properties of photoresist film resin byβ-cyclodextrin

作　　者：杨舒雅 杨淑娟 梁福根 杨飞 张勇[1] YANG Shu-ya;YANG Shu-juan;LIANG Fu-gen;YANG Fei;ZHANG Yong(Key Laboratory of Advanced Textile Materials and Manufacturing Technology of The Ministry of Education,Zhejiang Sci-Tech University,Hangzhou 310018,China;Company Limited of Zhejiang Transfar Whyyon Chemical,Hangzhou 311231,China;Company Limited of Zhejiang Yubo New Material,Taizhou 318000,China)

机构地区：[1]浙江理工大学先进纺织材料与制备技术教育部重点实验室,浙江杭州310018 [2]浙江传化华洋化工有限公司,浙江杭州311231 [3]浙江宇博新材料有限公司,浙江台州318000

出　　处：《化学工程师》2022年第7期1-6,共6页Chemical Engineer

基　　金：浙江省重点研发计划项目(2020C04015,2021C03160);浙江省基础公益研究计划项目(LGF18C160002,LY19C160010);浙江理工大学科研启动基金(11153132612101,11150131722121)。

摘　　要：光刻胶作为芯片的核心材料,对微电子技术的快速发展起着至关重要的作用,成膜树脂作为光刻胶的骨架组分,直接影响光刻胶的性能。本研究利用β-环糊精代替传统光刻胶中的化学成分,与二碳酸二叔丁酯合成制备环境友好型的t-BOC-β-环糊精成膜树脂。利用红外、^(1)H NMR、TG、XRD等先进仪器对其结构和性能进行分析表征,研究结果表明,在温度35℃、反应时间5h、β-环糊精与二碳酸二叔丁酯摩尔比为1∶10.5时,t-BOC基团在β-环糊精上取代度最高为16,制得的t-BOC-β-环糊精成膜树脂具有优异的耐热性和成膜性能,在190~195nm以外的紫外波长部分光透性非常好,经显影液浸泡后留膜率仅有2%。除此之外,β-环糊精分子量小,可以有效提高光刻胶分辨率,可用于制成248nm的高分辨率光刻胶产品。Photoresist is the core material of the chip,playing an important role in the rapid development of microelectronics technology.As the skeleton component of photoresist,the film forming resin directly affects the performance of photoresist.In this study,the environmentally friendly t-BOC-β-cyclodextrin film forming resin was synthesized using di-tert-butyl dicarbonate,which replace the traditional photoresist chemical composition.IR,1H NMR,TG,XRD,and other advanced instruments were employed to analyze the structure and properties of the samples.The results showed that at 35℃,reaction time 5h,the molar ratio ofβ-cyclodextrin and di-tert-butyl dicarbonate is 1∶10.5,theβ-cyclodextrin with highest degree 16 of substitution of t-BOC group.Resulting in t-BOC-β-cyclodextrin film forming resin with excellent heat resistance and film forming properties.Moreover,the film forming resins possess better photopermeability ultraviolet wavelengths other than 190~195nm,the retention rate is only 2%after immersion in developer solution.In addition,the small molecular weight ofβ-cyclodextrin can effectively improve the resolution of photoresist,which has potential in producing photoresist products with high resolution of 248nm.

关 键 词：成膜树脂 Β-环糊精 二碳酸二叔丁酯 分子玻璃 

分 类 号：TQ322.4[化学工程—合成树脂塑料工业]