MoS_(2)薄膜厚度与光学性能的相关性研究  

Thickness-dependent optical properties of MoS_(2) thin film

作　　者：黄成斌 吴隽[1,2] 张邵奇 祝柏林[1,2] Huang Chengbin;Wu Jun;Zhang Shaoqi;Zhu Boling(College of Materials Science and Metallurgical Engineering,Wuhan University of Science and Technology,Wuhan 430081,China;State Key Laboratory of Refractories and Metallurgy,Wuhan University of Science and Technology,Wuhan 430081,China)

机构地区：[1]武汉科技大学材料与冶金学院,湖北武汉430081 [2]武汉科技大学省部共建耐火材料与冶金国家重点实验室,湖北武汉430081

出　　处：《武汉科技大学学报》2022年第6期424-429,共6页Journal of Wuhan University of Science and Technology

基　　金：武汉科技大学省部共建耐火材料与冶金国家重点实验室开放课题基金资助项目(2018QNll).

摘　　要：采用低功率射频磁控溅射方法分别在玻璃和Si衬底表面沉积不同厚度的MoS_(2)薄膜,经硫化退火处理后,利用Raman光谱、AFM、UV-Vis光谱和45°镜面反射光谱,对MoS_(2)薄膜结构及光谱性质进行表征。结果表明,两种衬底上沉积的MoS_(2)薄膜经退火处理后均在670、615及400~500 nm处出现分别对应A、B、C激子的明显吸收峰和反射峰,表明所制MoS_(2)薄膜已结晶。A、B、C激子峰均随着薄膜层数增加而红移,表明MoS_(2)薄膜的能带结构随层数发生改变。另外,A、B激子峰位置不受光谱检测方式的影响,而45°镜面反射光谱中C激子峰则相对于UV-Vis光谱有一定红移,因此,可依据A、B特征激子峰的有无及峰位判定MoS_(2)薄膜的结晶度及层数,其中45°镜面反射光谱可用于非透明材料衬底上MoS_(2)薄膜厚度(或层数)的判定。MoSthin films of different thicknesses were deposited on glass and Si substrates respectively by low-power radio frequency magnetron sputtering method. After sulfide annealing, the structural and spectral properties of as-prepared MoSthin films were characterized by Raman spectroscopy, AFM,UV-Vis absorption spectroscopy and 45° specular reflection spectroscopy, etc. The results show that the as-annealed MoSthin films on both substrates have obvious absorption and reflection peaks corresponding to A, B and C excitons at 670, 615 and 400~500 nm, respectively, indicating that the as-prepared MoSfilms have been crystallized. The peaks of A, B and C excitons all gradually red-shift with the increase of number of layers, suggesting that the band structure of MoSchanges with the number of layers. Moreover, the positions of A and B exciton peaks are not affected by the spectral detection method, while the C exciton peak position as showed in 45° specular reflection spectra has a certain red-shift compared with that in UV-Vis spectra. Therefore, the crystallinity and number of layers of MoSthin films can be determined according to the presence or absence and the position of A and B exciton peaks, and the 45° specular reflection spectrum can be used to identify the thickness(or layer number) of MoSthin films on non-transparent substrates.

关 键 词：MoS_(2)薄膜 薄膜厚度 磁控溅射 光学特性 反射光谱 激子峰 

分 类 号：TQ136.12[化学工程—无机化工] TB383.2[一般工业技术—材料科学与工程]