精细雾化抛光TC4钛合金抛光液优化研究  

Optimization of Polishing Fluid of Fine Atomization Polishing TC4 Titanium Alloy

作　　者：杨思远 苑晓策 李庆忠 YANG Siyuan;YUAN Xiaoce;LI Qingzhong(College of Mechanical Engineering,Jiangnan University,Wuxi Jiangsu 214122,China)

机构地区：[1]江南大学机械工程学院,江苏无锡214122

出　　处：《润滑与密封》2022年第10期65-70,共6页Lubrication Engineering

基　　金：国家自然科学基金项目(51175228)。

摘　　要：配制适用于TC4钛合金雾化施液抛光的特种抛光液,通过抛光实验获得纳米级的光滑钛合金表面。研究不同磨料、氧化剂和络合剂含量对钛合金材料去除率和表面粗糙度的影响,通过正交试验优化抛光液组成及配比。优化后的抛光液由质量分数20%的SiO_(2)磨料、0.1%的柠檬酸、1%的聚乙二醇-400、2%的H_(2)O_(2)组成,pH值为4。抛光试验结果表明,优化后抛光液的抛光效果较好,材料去除率及试件表面质量均有所提升,其中材料去除率为549.87 nm/min,表面粗糙度为0.678 nm。XPS分析表明,抛光过程中钛合金表层在酸性环境下与H_(2)O_(2)和柠檬酸反应,生成了易于通过机械作用去除的氧化层。A special polishing fluid suitable for atomizing polishing of TC4 titanium alloy was prepared. The smooth surface of titanium alloy at nanometer level was obtained through polishing experiments. The effects of different content of abrasives, oxidants and complexing agents on the removal rate and surface roughness of titanium alloy materials were studied. The composition and proportion of polishing solution were optimized by orthogonal experiment.The optimized polishing solution consists of 20% SiO_(2) abrasive, 0.1% citric acid, 1% polyethylene glycol-400, and 2% H_(2)O_(2), with a pH value of 4.The polishing test results show that the optimized polishing solution has a good polishing effect, which improves the material removal rate and the surface quality of the specimen, reaches the material removal rate of 549.87 nm/min and the surface roughness of 0.678 nm.XPS analysis results support that the titanium alloy surface reacts with H_(2)O_(2) and citric acid in an acidic environment during polishing, forming an oxide layer that is easy to be removed by mechanical action.

关 键 词：化学机械抛光 精细雾化 TC4钛合金 抛光液 SiO_(2)磨料 

分 类 号：TG175.3[金属学及工艺—金属表面处理] TG146.23[金属学及工艺—金属学]