曝光剂量精度误差分析研究  

Analysis of Exposure Dose Accuracy Error

作　　者：高爱梅[1] 宫晨[1] 张乾[1] 黄晓鹏[1] GAO Aimei;GONG Chen;ZHANG Qian;HUANG Xiaopeng(The 45th Research Institute of CETC,Beijing 100176,China)

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176

出　　处：《电子工业专用设备》2022年第5期10-12,23,共4页Equipment for Electronic Products Manufacturing

摘　　要：曝光剂量精度是光刻工艺中重要的控制参数,从剂量控制模型出发,分析了影响剂量精度的因素并建立误差模型,进一步将需求指标分解到各误差项,作为剂量控制系统的设计输入;通过试验测试剂量精度和重复精度满足设计需求,验证了剂量误差模型的准确性。Exposure dose precision is an important control parameter in lithography technology.Based on the dose control model,this paper analyzes the factors affecting the dose precision and establishes the error model.Further,the demand index is decomposed into each error term,which is used as the design input of the dose control system.The dose precision and repeatability were tested to meet the design requirements,and the accuracy of the dose error model was verified.

关 键 词：剂量精度 剂量重复精度 曝光剂量 线宽均匀性 

分 类 号：TN305.7[电子电信—物理电子学]