极紫外同步辐射光表征离子束诱导的纳米波纹  

Characterization of Ion Beam Induced Nanoripples by Using Extreme Ultraviolet Synchrotron Radiation

作　　者：李金昱 杨高元 臧昊峰 陈火耀[1] 霍同林[1] 周洪军[1] 鲁拥华[2] 刘颖[1] 洪义麟[1] 付绍军[1] Li Jinyu;Yang Gaoyuan;Zang Haofeng;Chen Huoyao;Huo Tonglin;Zhou Hongjun;Lu Yonghua;Liu Ying;Hong Yilin;Fu Shaojun(National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029,Anhui,China;Department of Optics and Optical Engineering,University of Science and Technology of China,Hefei 230026,Anhui,China)

机构地区：[1]中国科学技术大学国家同步辐射实验室,安徽合肥230029 [2]中国科学技术大学光学与光学工程系,安徽合肥230026

出　　处：《光学学报》2022年第19期210-214,共5页Acta Optica Sinica

基　　金：国家自然科学基金(11675169)。

摘　　要：离子轰击固体表面诱导的纳米结构具有小周期(10~100 nm)、大面积、准周期的特点。利用氩离子轰击在减反膜上制备出横向特征尺寸在100 nm附近、横向周期性与纵向连续性逐步明显的准周期纳米波纹结构。为了增大表征面积,利用极紫外散射法表征了上述自组织纳米波纹的形貌特征。结果显示,面内和锥角模式的极紫外散射法所获得的样品横向和纵向形貌特征,均能够与原子力扫描显微镜所获得的样品形貌特征相对应,这初步说明了此方法表征准周期纳米波纹结构基本形貌特征的可行性,为后续的定量分析提供基础。同时,利用极紫外同步辐射光表征的自组织纳米结构面积达到了mm^(2)量级,将合肥光源计量光束线的表征范围拓展到自组织纳米结构,这也为未来探索极紫外光刻掩模的散射表征等研究提供参考。Quasi-periodic nanostructures induced by ion bombardment(IB)on solid surfaces are characterized by small periods(10-100 nm)and large areas.Quasi-periodic nanoripple structures with the transverse feature size of around100 nm and the gradually significant transverse periodicity and longitudinal continuity were fabricated on antireflection coatings by Argon-IB.To improve the characterization area,the morphological characteristics of the self-organized nanoripples were characterized by using extreme ultraviolet(EUV)scatterometry.The results show that in terms of samples,their transverse and longitudinal morphological features obtained by the in-plane and conical mode of the EUV scatterometry are in agreement with those obtained by atomic force microscope.These results demonstrate that the proposed method is feasible to characterize the basic morphological characteristics of quasi-periodic nanoripples and can provide a basis for subsequent quantitative analysis.In addition,the characterization area of self-organized nanoripple structures has reached an order of the mm^(2)by EUV synchrotron radiation,and the characterization range of the Metrology Beamline of Hefei Light Source is extended to self-organized nanostructures,which can provide a reference for future studies on the scattering characterization of EUV lithography masks.

关 键 词：极紫外 散射测量 同步辐射 离子轰击 自组织纳米结构 准周期 

分 类 号：O434[机械工程—光学工程]