从极紫外光刻发展看全球范围内的技术合作  

Global technical cooperation from the perspective of extreme ultraviolet lithography development

作　　者：曾海峰 郭磊 李世光[1,2,3] 钟志坚 李琛毅 余江 李显杰 ZENG Haifeng;GUO Lei;LI Shiguang;ZHONG Zhijian;LI Chenyi;YU Jiang;LI Xianjie(Department of Achievement Transformation,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;School of Integrated Circuits,University of Chinese Academy of Sciences,Beijing 100049,China;Jiangsu Yingsu Integrated Circuit Equipment Co.Ltd.,Xuzhou 221300,China;Institutes of Science and Development,Chinese Academy of Sciences,Beijing 100190,China)

机构地区：[1]中国科学院微电子研究所成果转化部,北京100029 [2]中国科学院大学集成电路学院,北京100049 [3]江苏影速集成电路装备股份有限公司,徐州221300 [4]中国科学院科技战略咨询研究院,北京100190

出　　处：《激光技术》2023年第1期1-12,共12页Laser Technology

基　　金：江苏省科技成果转化专项资金资助项目(BA2021033)。

摘　　要：在针对芯片的“卡脖子”技术中,极紫外(EUV)光刻是最重要的一环。EUV光刻技术已经被广泛应用于最先进工艺节点的集成电路芯片制造之中。它的研发交叉融合了光学、机械、电子、控制、软件、材料、数学、物理等多个学科的知识。EUV光刻的发展反映了世界范围内联合研发的演变过程,开放和合作是发展过程中的主旋律。回顾了EUV光刻的发展历史及所涉及的重大项目和机构,讨论了全球唯一的EUV光刻机制造商——ASML公司的灵活多变的国际化合作路线,分析了自1997年以来世界各代表性研发机构的研发趋势以及与EUV光刻发展的关系,详叙了各参与机构在世界范围内的合作对EUV光刻发展的影响。该研究为研发先进光刻机等类似高端装备提供了一些启示和参考。Extreme ultraviolet(EUV) lithography is the most important part of the “neck” technology for chips. EUV lithography technology has been widely used in the manufacturing of integrated circuit chips with the most advanced process nodes. Its research and development cross integrates the knowledge of optics, machinery, electronics, control, software, materials, mathematics, physics and other disciplines. The development of EUV lithography reflects the evolution of joint research and development worldwide, and openness and cooperation are the main themes in the development process. The development history of EUV lithography and the major projects and institutions involved were reviewed. The flexible international cooperation route of ASML, the world’s only EUV lithography manufacturer, was discussed. The research and development trends of representative research and development institutions in the world since 1997 and the relationship with the development of EUV lithography were analyzed. The influence of worldwide cooperation among participating institutions on the development of EUV lithography was described in detail. This research provides some enlightenment and reference for the research and development of advanced lithography machines and other similar high-end equipment.

关 键 词：集成光学 光刻 极紫外 集成电路 合作 发展 

分 类 号：TN305.7[电子电信—物理电子学]