HALF银铜管道的多腔TiZrV镀膜初步研究  

Multi-Chamber TiZrV Coating in OFS Copper Vacuum Chamber for HALF

作　　者：赵壮 马文静 葛晓琴 王思慧 洪远志[1] 尉健亚 张善才[1] 范乐[1] ZHAO Zhuang;MA Wenjing;GE Xiaoqin;WANG Sihui;HONG Yuanzhi;WEI Jianya;ZHANG Shancai;FAN Le(National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029,China;School of Electrical Engineering and Automation,Anhui University,Hefei 230301,China)

机构地区：[1]中国科学技术大学国家同步辐射实验室,合肥230029 [2]安徽大学电气工程与自动化学院,合肥230301

出　　处：《真空科学与技术学报》2023年第1期21-28,共8页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金项目(11905219);国家自然科学基金项目(12175225)。

摘　　要：NEG镀膜技术可以在狭长的真空腔内实现超高真空,这对衍射极限储存环至关重要。为满足HALF光源工程对NEG镀膜真空腔的进度和质量需求,基于之前的单管NEG镀膜工作,发展了多腔镀膜技术并开展了系列技术研究,利用扫描电子显微镜,原子力显微镜,能量色散X射线能谱对NEG薄膜进行表征,利用X射线光电子能谱对NEG薄膜的激活特性进行分析。结果表明多腔系统中各真空管之间,以及与之前的单管镀膜真空管内壁薄膜的表面形貌,断面形貌,表面粗糙度和组成成分大体相同,在180℃保温2 h后,NEG薄膜表面的金属高价态被还原成了低价态并出现了Ti、Zr、V的金属态,这与之前单个镀膜真空腔的结果一致。三根此种方法镀膜真空腔串联安装,并配有SIP组成真空系统来模拟HALF储存环真空的实际工作状态。经180℃激活24 h后,腔体远端真空度为4.13×10^(-8)Pa,且真空度随时间变化缓慢变好,放置260 h后真空度可以达到3.74×10^(-8)Pa,这将为HALF真空系统工作提供有利的技术支持。NEG coating is a competitive candidate to achieve ultra-high vacuum in narrow gap vacuum chambers,which is very important for diffraction-limited storage ring.To get enough NEG coated chambers in schedule for HALF,a multi-chamber coating system was employed,and some multi-coating research was performed based on previous work.The NEG film was characterized and analyzed by scanning electron microscopy,atomic force microscopy,and energy dispersive X-ray energy spectroscopy,and the activation characteristics of NEG films were analyzed by X-ray photoelectron spectroscopy.The results show that the surface morphology,crosssectional morphology,surface roughness,and composition of the film coated by different chambers are about the same.After activation at 180℃ for 2 h,the high oxidation state of the surface metal was transferred to a low oxidation state or metallic state,which is similar to that of the previous single-chamber coating.Three NEG coated chambers were equipped with SIP to simulate work status,and after activation at 180℃ for 24 h,the pressure at the end of chambers was 4.13×10^(-8)Pa,which reached 3.74×10^(-8)Pa after about 260 h,which would benefit future HALF vacuum system.

关 键 词：多腔镀膜 非蒸散型吸气剂 磁控溅射 粒子加速器 

分 类 号：TL503.7[核科学技术—核技术及应用]