光刻与化学机械抛光技术原位集成制备SU-8微透镜阵列  

In-Situ Integrated Fabrication of SU-8 Microlens Array by Lithography and Chemical Mechanical Polishing

作　　者：张清泽 吴永进 马闯北 石现 孙云娜 丁桂甫[1] Zhang Qingze;Wu Yongjin;Ma Chuangbei;Shi Xian;Sun Yunna;Ding Guifu(National Key Laboratory of Science and Technology on Micro/Nano Fabrication,Shanghai Jiao Tong University,Shanghai 200240,China;Department of Micro/Nano Electronics,School of Electronic Information and Electrical Engineering,Shanghai Jiao Tong University,Shanghai 200240,China)

机构地区：[1]上海交通大学微米/纳米加工技术国家级重点实验室,上海200240 [2]上海交通大学电子信息与电气工程学院微纳电子学系,上海200240

出　　处：《微纳电子技术》2023年第2期305-312,共8页Micronanoelectronic Technology

摘　　要：垂直腔面发射激光器通常与微光学元件组合使用,以改善激光束的聚焦或准直效果。研究了一种光刻和化学机械抛光技术相结合的新工艺方法,用于原位制备SU-8微透镜阵列。通过调控光刻参数,可以精确控制微透镜的直径与高度。实验制备了不同尺寸的SU-8微透镜阵列,它们具有光滑的表面,分辨率可达12.7 lp/mm,展示出良好的光学特性与高稳定性。这是一种低成本和高良率的微透镜制备方法,适用于在已成型的垂直腔面发射激光器表面原位集成制备高精度定位的微透镜,无需额外的光学对准、转移和键合步骤。Vertical-cavity surface-emitting lasers are usually used with micro-optical components to improve the focusing or collimation effects of the laser beam.A novel processing method combining photolithography and chemical mechanical polishing for the in-situ fabrication of SU-8 microlens arrays was studied.The diameter and height of the microlenses can be controlled precisely by adjusting the lithography parameters.Besides,the SU-8 microlens arrays with different dimensions were fabricated.Their surfaces are smooth,and the resolution can reach 12.7 lp/mm,demonstrating excellent optical properties and high stability.The method is low-cost and high-yield for fabricating microlenses.More importantly,it is suitable for the in-situ integrated fabrication of microlenses with high precision positioning on the surface of shaped vertical cavity surface emitting lasers,free of extra steps of optical alignment,transfer and bonding.

关 键 词：微透镜阵列 SU-8 原位 化学机械抛光 垂直腔面发射激光器 

分 类 号：TN305.7[电子电信—物理电子学] TN305.2