大视场大数值孔径显微物镜光学设计  被引量:2

Design of Large Field of View and High Numerical Aperture Microscope Objective

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作  者:黄木旺 刘旭[1] 林法官 Huang Muwang;Liu Xu;Lin Faguan(College of Optical Science and Engineering,Zhejiang University,Hangzhou 310027,Zhejiang,China;Foctek Photonics,Inc.,Fuzhou 350100,Fujian,China)

机构地区:[1]浙江大学光电科学与工程学院,浙江杭州310027 [2]福建福特科光电股份有限公司,福建福州350100

出  处:《激光与光电子学进展》2023年第5期217-221,共5页Laser & Optoelectronics Progress

摘  要:在纳米激光直写加工系统中,显微物镜是其中的关键部件,行业发展的趋势是在大数值孔径(NA)下具有更大的物方视场,并且能适应双光子聚合(Two-photon polymerization,TPP)胶折射率的变化。对比当前TPP效应研究所用显微物镜的指标,挖掘了物方视场、NA和镜片数的关系,并提出物镜的合成敏感度指标(Synthetic sensitivity index,Iss)。结合Iss设计了一款波段为500~800 nm、NA大于1.3、物方视场为1.0 mm的显微物镜。该物镜的设计结果为,调制传递函数曲线接近衍射极限,波像差均方根小于0.07λ,以内调焦方式来适应TPP胶折射率的变化。公差分析表明该设计结果具有可行性。The microscope objective is the key component of the nanolaser direct writing processing system,and the development trend in industry involves a large objectside field of view under a large numerical aperture(NA)and adapting to the change of the refractive index of the photoresist for twophoton polymerization(TPP).This paper compares the indicators of the microscope objective used in current TPP effect research,excavates the relationship between the objectside field of view,NA,and number of lenses,and proposes the objective synthetic sensitivity index(Iss).Combined with the Iss,a microscope objective with a wavelength range of 500‒800 nm,NA>1.3,and an objectside field of view of 1.0 mm is designed.The resultant design of the objective lens involves a modulation transfer function curve close to the diffraction limit and a root mean square of wave aberration less than 0.07λand uses the internal focusing method to adapt to the change of photoresist refraction for TPP.Tolerance analysis demonstrates that the design results are feasible.

关 键 词:光学设计 大视场 大数值孔径 平场复消色差显微物镜 激光直写 微纳加工 

分 类 号:O439[机械工程—光学工程]

 

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