二五混水平U型设计的Lee偏差下界  

Lower bounds of Lee discrepancy for mixed two and five level U-type designs

作　　者：李伟 汪政红[1] LI Wei;WANG Zhenghong(College of Mathematics and Statistics,South-Central Minzu University,Wuhan 430074,China)

机构地区：[1]中南民族大学数学与统计学学院,武汉430074

出　　处：《中南民族大学学报（自然科学版）》2023年第4期571-576,共6页Journal of South-Central University for Nationalities：Natural Science Edition

基　　金：国家统计局优选资助项目(2022LY051);中央高校基本科研业务费专项资金资助项目(CZQ22003)。

摘　　要：研究了二五混水平U型设计在Lee偏差下的均匀性,利用两种不同的新方法,即CHATTERJEE和HU的方法得到了二五混水平U型设计的两个下界,并将它们综合成一个下界,同时以数值实例验证了该综合下界是紧的,且优于以往文献中的下界.The uniformity of mixed two and five level U-type designs in terms of Lee discrepancy is focused on.Two new methods of CHATTERJEE and HU are used to get two new lower bounds of mixed two and five level U-type designs,and a syntheticlower bound is derived.Numerical examples are also provided to verify that the synthetic lower bound is tight and better than the old one inexisting literature.

关 键 词：Lee偏差 二五混水平设计 U型设计 下界 

分 类 号：O212.6[理学—概率论与数理统计]