碳化硅工艺炉过温保护系统设计与研究  

Design and Research of Over-temp Protection System for SiC Process Furnace

作　　者：文正 黄心沿 杨金 盛旭 禹庆荣 黄影 WEN Zheng;HUANG Xinyan;YANG Jin;SHENG Xu;YU Qingrong;HUANG Ying(The 48^(th) Research Institute of CETC,Changsha 410111,China;Hunan Red Solar Photoelectricity Science and Technology Co.,Ltd.,Changsha 410221,China)

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111 [2]湖南红太阳光电科技有限公司,湖南长沙410221

出　　处：《电子工业专用设备》2023年第3期10-14,共5页Equipment for Electronic Products Manufacturing

摘　　要：半导体材料加工的过程中,温度作为非常重要的因素将直接影响工艺质量及设备的稳定性与安全性。半导体工艺设备为防止超温,设计了过温保护系统。通过详述过温保护系统的工作原理、核心线路、控制回路与产品验证的相关过程,证明该过温保护系统性能良好,能安全、稳定、高效的运行。In the process of semiconductor material processing,temperature as a very important factor,will directly affect the process quality and the stability and safety of equipment.An over-temp protection system is designed for semiconductor process equipment to prevent overheating.The working principle,core circuit,control loop,and product verification process of the over temperature protection system are elaborated in this paper,and proving that the over-temp protection system is effective and can operate safely,stably,and efficiently.

关 键 词：碳化硅 过温保护系统 半导体材料 半导体工艺设备 

分 类 号：TN304.05[电子电信—物理电子学]