聚二硫二丙烷磺酸钠对电沉积纳米孪晶铜的影响  被引量:2

The influence of poly-2-sulfur-2-propane sodium sulfonate on the electrodeposition of nanotwinned copper

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作  者:张妍嘉 凌惠琴[1] 杭弢[1] 胡安民[1] 吴蕴雯 李明[1] Zhang Yanjia;Ling Huiqin;Hang Tao;Hu Anmin;Wu Yunwen;Li Ming(School of Materials Science and Engineering,Shanghai Jiao Tong University,Shanghai 200240,China)

机构地区:[1]上海交通大学材料科学与工程学院,上海200240

出  处:《电镀与精饰》2023年第8期1-6,共6页Plating & Finishing

基  金:国家自然科学基金资助项目(No.21972091);国家自然科学基金资助项目(No.62004124);国家自然科学基金重大项目(No.51991374)。

摘  要:以聚二硫二丙烷磺酸钠(SPS)、明胶蛋白胨(GP)、氯离子为添加剂采用直流电镀制备了高度(220)择优取向的纳米孪晶铜,并探究了其形核机理。结果表明,加入SPS会使镀层由(111)和(220)取向转变为具有(220)择优取向的纳米孪晶铜,并且SPS浓度会强烈影响镀层的过渡层厚度。SPS和GP在铜表面竞争性吸附,使镀层的内应力比单一添加剂时更高,镀层通过形成(220)择优取向孪晶铜释放内应力。纳米孪晶铜的形核和生长受到电流密度和添加剂的共同影响,在合适的过电位下镀层才能通过形成孪晶来释放应变能。在20 mg/L SPS、4 A/dm^(2)条件下,孪晶结构最完整,过渡层最薄。The highly preferred(220)-oriented nanotwinned copper(nt-Cu)was fabricated by direct current electrodeposition with poly-2-sulfur-2-propane sodium sulfonate(SPS),gelatin peptone(GP)and chloride ion.The nucleation mechanism of nt-Cu was investigated.The results show that SPS could change the texture of the Cu films from(111)and(220)to highly preferred(220).Besides,the concentration of SPS has strong influence on the thickness of the transition layer.SPS and GP would adsorb on the surface competitively,which makes the internal stress of the Cu films higher than that of single additive.The Cu films release the internal stresses by the formation of(220)-oriented nt-Cu.The nucleation and growth of nt-Cu is influenced by current density and additives.Under the appropriate overpotential,the Cu film could release the strain energy through the formation of twins.The twin structure is the most complete and the transition layer is the thinnest with 20 mg/L SPS and 4 A/dm^(2).

关 键 词:纳米孪晶铜 电沉积 (220)择优取向 

分 类 号:TQ153.2[化学工程—电化学工业]

 

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