显示领域用光刻胶技术专利研究进展  

Patent research progress of photoresists in the field of display

作　　者：徐靖[1] 张伟 XU Jing;ZHANG Wei(Patent Examination Cooperation Beijing Center of the Patent Office,CNIPA,Beijing 100160,China;Visionox Technology Co.,Ltd.,Beijing 100102,China)

机构地区：[1]国家知识产权局专利局专利审查协作北京中心化学部,北京100160 [2]维信诺科技股份有限公司,北京100102

出　　处：《精细与专用化学品》2023年第10期10-15,28,共7页Fine and Specialty Chemicals

摘　　要：以人类视觉感官享受极致化为核心追求的显示技术,其在分辨率和对比度等关键性能参数的实现,在材料端高度依赖光刻胶。光刻胶是一种对特定谱段光敏感的混合液体,从组成角度可分为光敏组分、光刻胶树脂、活性稀释剂、溶剂和其他添加剂。其利用光化学反应,经曝光、显影、烘烤、蚀刻等光刻工序,将所需微细图形从光罩转移到待加工基材上。作为当今平板显示领域的关键原材料,对已公开光刻胶相关专利技术进行整理和分析,以期为相关产业领域人员提供参考。The display technology pursued with the ultimate enjoyment of human visual senses as the core pursuit,its resolution and contrast and other key performance parameters were highly dependent on photoresist.Photoresist was a mixed liquid that was sensitive to light with specific spectrum,and its composition can be divided into photosensitive components,resins,reactive diluents(or monomers),solvents and other additives.It used photochemical reactions to transfer the required micro-patterns from the photo-mask to the substrate through exposuring,development,baking,etching and other photographic process.As the crucial raw material for flat panel display industry,the relevant patents of photoresist have been searched and analyzed,in order to provide some help for the research institutions and related enterprises.

关 键 词：光刻胶 平板显示 分辨率 对比度 专利 

分 类 号：TQ571[化学工程—精细化工]