偏压对高功率脉冲磁控溅射法沉积MoN涂层结构及性能的影响  

Effect of Bias Voltages on the Structure and Properties of MoN Coatings Deposited by High Power Pulsed Magnetron Sputtering

作　　者：康建 隋旭东 杨淑燕 周海斌 郝俊英[2,3] 万勇 刘维民 KANG Jian;SUI Xudong;YANG Shuyan;ZHOU Haibin;HAO Junying;WAN Yong;LIU Weimin(School of Mechanical and Automotive Engineering,Qingdao University of Technology,Shandong Qingdao 266033,China;State Key Laboratory of Solid Lubrication,Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences,Gansu Lanzhou 730000,China;Qingdao Center of Resource Chemistry and New Materials,Shandong Qingdao 266000,China)

机构地区：[1]青岛理工大学机械与汽车工程学院,山东青岛266033 [2]中国科学院兰州化学物理研究所固体润滑国家重点实验室,甘肃兰州730000 [3]青岛市资源化学与新材料研究中心,山东青岛266000

出　　处：《摩擦学学报》2023年第10期1118-1127,共10页Tribology

基　　金：国家自然科学基金(51835012,51975554);甘肃省科技计划(21JR7RA081);基础研究计划(2020-JCJQ-ZD-155-12);西部之光项目资助。

摘　　要：采用高功率脉冲磁控溅射(HiPIMS)方法在9Cr18钢基材上制备了MoN涂层.系统研究了不同偏压对其结构、力学性能以及摩擦学性能的影响,并优化出耐磨性优异的MoN涂层.采用场发射扫描电镜分析涂层的表面和截面形貌,采用X-射线衍射仪分析涂层的晶相结构,采用纳米压痕仪测量涂层的硬度和弹性模量,采用摩擦磨损试验机(CSM)评价涂层的摩擦磨损性能.结果表明:随着偏压的增加,涂层由柱状晶体结构向致密无特征晶体结构转变,相结构以面心立方Mo_(2)N相为主.HiPIMS方法制备的MoN涂层均表现出较高的硬度(28 GPa以上)和较好的膜基结合力(60 N左右).摩擦学性能方面,在120 V偏压下沉积得到的涂层摩擦系数最低,为0.24;而在160 V偏压下沉积的涂层磨损率最低,为1.4×10^(-8)mm^(3)/(N·m).In this study,MoN coating was deposited on 9Cr18 steel substrate and Si wafer by high power pulsed magnetron sputtering.The effects of different bias voltages on the microstructure,mechanical properties and tribological properties of MoN coatings were systematically studied,and the coatings with excellent wear resistance were selected.The surface and cross-section morphology of the coating were analyzed by field emission scanning electron microscopy.The crystal phase structure of the coatings were analyzed by X-ray diffractometer.The hardness and elastic modulus of the coating were measured by nanoindenter.The adhesion of coating was analyzed by scratch tester.Three-dimensional profilometer was used to analyze the wear depth of MoN coating.The friction and wear properties of the coatings were evaluated by CSM friction and wear tester.The results showed that:in terms of microstructure,the surface of MoN coating deposited by HiPIMS technology was compact and smooth,and there were no obvious defects such as large particles and microcracks.With the increase of bias voltage,the ion bombardment on the substrate was enhanced,which made the grown columnar crystal interrupted,the coating changed from columnar crystal structure to compact and featureless crystal structure.And the phase structure was dominated by face-centered cubic Mo_(2)N phase,with a small amount of Mo phase structure.In terms of mechanical properties,with the increase of bias voltage,the ion bombardment effect increased,and the hardness of the coating gradually increased.When the bias voltage was 160 V,the hardness of the coating was the highest,reaching 33 GPa.The elastic modulus of MoN coating showed a trend of increasing at first and then decreasing,when the bias voltage was 120 V,the maximum elastic modulus was 357.7 GPa.The corresponding increase of H/E and H3/E2 values also represented the enhancement of wear resistance of MoN coating.MoN coating deposited by HiPIMS method all showed good coating-substrate adhesion(about 60 N).However,with the inc

关 键 词：HIPIMS MoN涂层 偏压 摩擦磨损 耐磨性 

分 类 号：TH117.1[机械工程—机械设计及理论]