Si_(3)N_(4)基底表面粗糙度对HFCVD法制备金刚石薄膜摩擦学性能的影响  

Effect of Si_(3)N_(4) substrate surface roughness on the wear resistance of diamond film prepared by HFCVD

作　　者：王贺 温凯翔[1] 闫广宇 王延祥 靳一帆[1] SU Peichen WANG He;WEN Kaixiang;YAN Guangyu;WANG Yanxiang;JIN Yifan;SU Peichen(Shenyang Jianzhu University,School of Mechanical Engineering,Shenyang 110000,China;Shenyang Jianzhu University,Joint International Research Laboratory of Modern Construction Engineering Equipment and Technology,Shenyang 110000,China;Shenyang Jianzhu University,National Local Joint Engineering Laboratory of High-grade Stone CNC Processing Equipment and Technology,Shenyang 110000,China;Nanyang Technological University,School of Mechanical and Aerospace Engineering,Singapore 639798)

机构地区：[1]沈阳建筑大学机械工程学院,沈阳110000 [2]沈阳建筑大学现代建筑工程装备与技术国际合作联合实验室,沈阳110000 [3]沈阳建筑大学高档石材数控加工装备与技术国家地方联合工程实验室,沈阳110000 [4]南洋理工大学机械与宇航工程学院,新加坡639798

出　　处：《金刚石与磨料磨具工程》2023年第5期604-611,共8页Diamond & Abrasives Engineering

基　　金：国家自然科学基金(51942507);学科创新引智项目(D18017);耐磨及功能薄膜制备与应用研究(G2022006012L);陶瓷轴承材料基体复合涂层制备及其性能研究(2022JH2/101300234);中央军委科学技术委员会项目(20-163-00-TS-006-002-11)。

摘　　要：采用热丝化学气相沉积法(hot filament chemical vapour deposition,HFCVD)在不同表面粗糙度的Si3N4基底表面制备金刚石薄膜,并对薄膜的特性进行检测与分析。利用场发射电子扫描显微镜、原子力显微镜检测植晶后的Si3N4基底表面以及制备的金刚石薄膜表面形貌;利用多功能摩擦磨损实验机、探针式轮廓仪,在干摩擦条件下,测试金刚石薄膜的摩擦系数及磨损率。综合基底粗糙度对植晶质量的影响、金刚石薄膜表面形貌与摩擦磨损检测实验结果,确定了Si3N4基底表面粗糙度对金刚石薄膜耐磨性的影响。结果表明:基底表面粗糙度会影响植晶的均匀性及致密性,进而影响金刚石颗粒在基底表面的生长,同时基底的表面形貌也会复映在金刚石薄膜表面。表面粗糙度为0.15μm和0.20μm的基底所制备的金刚石薄膜拥有较好的耐磨性,可得到最低的磨损率1.75×10^(−7)mm^(3)/(m·N)和最低的摩擦系数0.078。Diamond films were prepared by hot wire chemical vapour deposition on silicon nitride substrates with different surface roughness,and their properties were examined and analysed.The surface morphology of the crystallised silicon nitride substrates and the prepared diamond films were examined using field emission electron scanning microscopy and atomic force microscopy.The friction coefficient and wear rate of the diamond films were tested under dry friction conditions using a multi-functional friction and wear tester and a probe profiler.The effect of substrate roughness on the quality of the implant,the surface morphology of the diamond film,and the friction wear test results were combined to determine the effect of the surface roughness of the silicon nitride substrate on the wear resistance of the diamond film.The results show that the surface roughness of the substrate affects the uniformity and denseness of the implant,which in turn affects the growth of diamond particles on the surface of the substrate.The surface morphology of the substrate is also reflected on the surface of the diamond film.The substrates with surface roughness of 0.15μm and 0.20μm have good wear resistance,with the lowest wear rate of 1.75x10^(−7)mm^(3)/mN and the lowest coefficient of friction of 0.078.

关 键 词：氮化硅 表面粗糙度 热丝化学气相沉积 金刚石薄膜 耐磨性 

分 类 号：TQ164[化学工程—高温制品工业] TQ174.12