微光刻材料标准化研究  

Study on the Standardization of Microlithography Materials

作　　者：张子晴 王一刚[2] 

机构地区：[1]北京大学 [2]中国电子技术标准化研究院

出　　处：《信息技术与标准化》2023年第12期85-88,共4页Information Technology & Standardization

摘　　要：为充分发挥好标准支撑、规范、引领产业发展的作用,开展微光刻材料标准的梳理分析工作,对国内现有微光刻材料标准按基础通用、产品、方法进行分类,详细介绍相关标准的具体内容、使用范围等方面,并与国外相关标准进行对比,综合分析我国微光刻材料标准在掩模基片和抗蚀剂两大领域的优势和短板,为未来我国微光刻材料标准的发展提供参考。In order to give full play to the role of standards in supporting,standardizing and leading industrial development,this paper carries out the combing and analysis of microlithography material standards,and classifies the existing domestic microlithography material standards according to basic general purpose,products and methods,analyzes the specific content and application scope of relevant standards in detail,compares them with foreign relevant standards,and comprehensively analyzes the advantages and disadvantages of China's microlithography material standards in the two fields of mask substrate and resist.This paper provides a reference for the development of China's microgloss material standard in the future.

关 键 词：微光刻材料 掩模 抗蚀剂 标准化 

分 类 号：TN405[电子电信—微电子学与固体电子学]