氩气和氪气磁控溅射对Zr-Co-RE薄膜微观结构和吸氢性能的影响  

Influence on Microstructure and Hydrogen Adsorption Characterization of Zr-Co-RE Films Using Argon and Krypton as Magnetron Sputtering Gas

作　　者：周超[1] 马占吉[1] 何延春[1] 杨拉毛草 王虎[1] 李得天[1] ZHOU Chao;MA Zhanji;HE Yanchun;YANGLA Maocao;WANG Hu;LI Detian(Science and Technology on Vacuum Technology and Physics Laboratory,Lanzhou Institute of Physics,Lanzhou 730000)

机构地区：[1]兰州空间技术物理研究所真空技术与物理重点实验室,兰州730000

出　　处：《真空与低温》2024年第1期83-89,共7页Vacuum and Cryogenics

基　　金：甘肃省自然科学基金(23JRRA1355);甘肃省陇原青年创新创业人才项目。

摘　　要：为了获得吸气性能较好的Zr-Co-RE(RE为La和Ce稀土元素)吸气剂薄膜,采用直流磁控溅射方法,分别在氩气和氪气气氛中,通过改变沉积气压研究制备了不同结构的Zr-Co-RE薄膜。运用场发射扫描电镜、X射线衍射仪分析了不同溅射气压下溅射气氛对薄膜结构的影响;采用动态定压法分别测试了在氩气和在氪气中沉积的薄膜的吸氢性能,分析了溅射气氛和薄膜结构对吸氢性能的影响。结果表明,在同等气压下,用氩气溅射沉积的薄膜较致密,用氪气溅射沉积的薄膜表面分布有较多的团簇结构和裂纹结构,薄膜呈明显的柱状结构,且柱状组织间分布着大量的界面和间隙,为气体扩散提供了更多的路径;随着氩气和氪气气压增大,薄膜含有更多的裂纹和间隙结构,连续性柱状结构生长更明显,裂纹更深更宽,比表面积更大,有利于提高薄膜的吸氢性能。To obtain ZrCoRE(RE is rare earth elements La and Ce)getter films with good adsorption performance,DC magnetron sputtering was used to prepare ZrCoRE films with different structures in argon and krypton gas by changing the deposition pressure.The effects of sputtering gas on the microstructure of the films were analyzed by field emission scanning electron microscopy and X-ray diffraction.The hydrogen absorption properties of the films deposited in argon and krypton were tested by dynamic constant pressure method.The effect of sputtering gas and film structure on hydrogen absorption performance was analyzed.The results show that the films deposited in argon gas were relatively dense,while films deposited in krypton sputtering gas had more clusters and cracks in the microstructure.The films had an obvious columnar structure,and a lot of interfaces and gaps are distributed among the columnar structures,providing more paths for gas diffusion.Argon and krypton sputtering gas pressure increases,the film contains more cracks and gap structure,continuous columnar structure growth more obvious,and cracks deeper and wider.The structure had larger specific surface area,which is conducive to improving the hydrogen absorption performance of the films.

关 键 词：Zr-Co-RE薄膜 直流磁控溅射 氪气 溅射气压 微观结构 吸氢性能 

分 类 号：TB43[一般工业技术] TG174.444[金属学及工艺—金属表面处理]