CVD设备水冷循环系统的计算及设计  

Calculation and Design of Water Cooling Circulation System for CVD Equipment

作　　者：石磊 袁祖浩 巴赛 胡志坤 胡凡 刘柱 万胜强 SHI Lei;YUAN Zuhao;BA Sai;HU Zhikun;HU Fan;LIU Zhu;WAN Shengqiang(The 48th Research Institute of CETC,Changsha 410111,China)

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《电子工业专用设备》2023年第6期88-94,共7页Equipment for Electronic Products Manufacturing

基　　金：湖南省科技厅重大专项(2020GK1030)。

摘　　要：CVD设备水冷循环系统能防止材料在室壁上生长,使反应室得到充分及时地冷却,保证设备的安全运行。根据当前一种主流的CVD设备结构,对设备各冷却部件需要的冷却要求进行了分析计算,确定了各冷却支路需要的管径大小,提出了CVD设备水冷循环系统的结构设计方案,并根据实际运行结果验证了该水冷循环系统的合理性及可行性,满足CVD设备连续工艺对水冷循环系统的要求。The water cooling circulation system of the CVD equipment prevents the growth of material on the chamber wall,allowing the reactor chamber to be cooled adequately and timed to ensure the safety of the equipment.The cooling requirements of each cooling component of CVD equipment are analyzed and calculated according to the current mainstream structure of CVD equipment,and the pipe diameter of each cooling circuit is determined by the calculation results.Furthermore,this paper put forwards a structural design scheme for the water cooling circulation system of CVD equipment,and verifies the rationality and feasibility of the designed water cooling circulation system according to the actual operation results,which demonstrates that the designed water cooling circulation system meets the requirements of continuous process of CVD equipment.

关 键 词：化学气相沉积 水冷循环系统 传热学 理论计算 结构设计 

分 类 号：TN304.05[电子电信—物理电子学]