具有双重显影特性的多用途单分子树脂化学放大光刻胶  

A Dual-Tone Chemically Amplified Molecular Photoresist for Multi-Purpose Lithography

作　　者：苑晓冬 陈金平[1,2] 于天君 曾毅[1,2] 李嫕[1,2] YUAN Xiao-Dong;CHEN Jin-Ping;YU Tian-Jun;ZENG Yi;LI Yi(Key Laboratory of Photochemical Conversion and Optoelectronic Materials,Technical Institute of Physics and Chemistry,Chinese Academy of Sciences,Beijing 100190,China;University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]中国科学院理化技术研究所,光化学转换与功能材料重点实验室,北京100190 [2]中国科学院大学,北京100049

出　　处：《应用化学》2024年第7期1024-1034,共11页Chinese Journal of Applied Chemistry

基　　金：国家自然科学基金(No.22090012)资助。

摘　　要：化学放大光刻胶(CARs)由于其在分辨率和灵敏度方面的出色性能而广泛应用于光刻领域。本文报道了一种基于单分子树脂的多用途化学放大光刻胶SP8-PAG_(AN),可同时用于365 nm光刻和电子束光刻。该体系主要由螺二芴结构的单分子树脂主体材料(SP-8Boc)和N-(三氟甲基磺酸酯基)蒽-1,9-二羧酰亚胺非离子型光致产酸剂(PAGAn)组成。测试了产酸剂PAGAN在365 nm紫外光激发下的光致产酸效率ΦH+为23%。研究了SP8-PAG_(AN)光刻胶的365 nm光刻和电子束光刻性能。365 nm光刻中,分别利用四甲基氢氧化胺(TMAH,质量分数2.38%)水溶液和正己烷作为显影液,可实现1μm正性和负性光刻图案。电子束光刻中,可实现50 nm Line/Space(L/S)的正性密集线条图案(曝光剂量110μC/cm^(2)),32 nm L/S的负性密集线条图案(曝光剂量40μC/cm^(2))以及19 nm L/3S负性半密集线条图案(曝光剂量96μC/cm^(2))。本研究工作提供了一种具有双重显影特性的多用途单分子树脂化学放大光刻胶的新范例。Chemically amplified photoresists(CARs)are widely used in photolithography due to their excellent performance in resolution and sensitivity.This paper reports a CAR(SP8-PAGAN)based on molecule glass of SP8-Boc and photo-acid generator of N-hydroxytrifluoromethylsulfonate anthracene-1,9-dicarboxyimide.The SP8-PAG_(AN) photoresist can be used for both 365 nm lithography and electron beam lithography(EBL).The quantum efficiency of acid generation(ΦH+)for the PAGAN is 23%under 365 nm excitation.1μm positive and negative lithographic patterns can be achieved with SP8-PAG_(AN) photoresist by 365 nm lithography using tetramethylammonium hydroxide(TMAH,2.38%)aqueous and n-hexane as developers,respectively.A positive 50 nm Line/Space(L/S)dense line pattern(dose 110µC/cm^(2)),a 32 nm L/S negative dense line pattern(dose 40µC/cm^(2)),and a 19 nm L/3S negative semi-dense line pattern(dose 96µC/cm^(2))were achieved by EBL.This study provides a new example of a dual-tone CAR for multi-purpose lithography.

关 键 词：化学放大光刻胶 双重显影 单分子树脂 365 nm光刻 电子束光刻 

分 类 号：O664.2[理学—分析化学]