负性光刻胶在纳米压印光刻技术的应用前景  

The Application Prospects of Negative Photoresist in Nanoimprint Lithography Technology

作　　者：杨志伟 吕薪羽 Yang Zhiwei;Lyu Xinyu(School of Intelligent Manufacturing,Jilin Vocational College of Industry and Technology,Jilin Jilin 132013,China)

机构地区：[1]吉林工业职业技术学院智能制造学院,吉林吉林132013

出　　处：《现代工业经济和信息化》2024年第7期135-137,共3页Modern Industrial Economy and Informationization

基　　金：吉林工业职业技术学院2023年度教育学会教学类课题“‘互联网+’背景下的高职智能制造技术类数控技术专业教学模式的创新与实践”(23jyy02)的研究成果之一;2024年度吉林省教育厅科学研究项目“新型自加热复合纳米压印膜的制备及应用”(JJKH20241130KJ)。

摘　　要：光刻技术在微纳米制造领域具有关键作用,而负性光刻胶因其低成本、高黏度的特点备受青睐。然而,负性光刻胶的分辨率限制在光刻线宽小于3μm时成为制约其应用的主要问题。结合纳米压印光刻技术的发展,探讨了负性光刻胶在纳米压印光刻领域的新趋势。纳米压印光刻技术的物理方法使其不受光刻胶分辨率限制,为负性光刻胶的应用提供了新的机遇。结合负性光刻胶的低成本优势,纳米压印光刻技术与负性光刻胶相结合,呈现出了不可替代的应用前景。Lithography technology plays a crucial role in the field of micro and nano manufacturing,and negative photoresists are highly favored due to their low cost and high viscosity.However,the resolution limitation of negative photoresist becomes the main constraint on its application when the lithography line width is less than 3 microns.This article explores the new trends of negative photoresists in the field of nanoimprint lithography,based on the development of nanoimprint lithography technology.The physical methods of nanoimprinting lithography technology make it unrestricted by the resolution of photoresist,providing new opportunities for the application of negative photoresist.Combining the low-cost advantage of negative photoresist,the combination of nanoimprint lithography technology and negative photoresist presents an irreplaceable application prospect.

关 键 词：光刻技术 负性光刻胶 纳米压印光刻技术 分辨率限制 微纳米制造 

分 类 号：TN305.7[电子电信—物理电子学]