用于SiC注入机的吸极系统设计  

Design of Extraction System for SiC Ion Implantor

作　　者：袁卫华 彭立波 罗才旺 游俊健 YUAN Weihua;PENG Libo;LUO Caiwang;YOU Junjian(The 48th Research Institute of CETC,Changsha 410111,China)

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《电子工业专用设备》2024年第5期17-21,共5页Equipment for Electronic Products Manufacturing

摘　　要：介绍了用于SiC注入机的离子束流吸极系统设计,吸极系统是一个三维可调的运动部件,吸极系统的电极板在X、Y、Z三轴伺服电机的驱动作用下实现3个方向精确可调;加载在电极板上的吸极高压和吸极抑制高压双重高压电场作用下,实现所需不同种元素离子或不同放电状态下的弧室内最优离子束流稳定的引出。The design of the extraction system for ion beam extraction in SiC ion implantor is introduced.The extraction system is a three-dimensional adjustable moving part,the electrode plate of the extraction system is accurately adjustable in three directions under the driving action of the X,Y and Z three-axis servo motor;under the action of the double high-pressure electric fields of the extraction high pressure and the extraction suppression high pressure loaded on the electrode plate,the optimal ion beam extraction in the arc chamber under different elements or different discharge states is realized.

关 键 词：碳化硅 注入机 吸极系统 

分 类 号：TN305.3[电子电信—物理电子学]