基于激光复合技术的金刚石抛光研究  

Diamond Polishing Based on Laser Composite Technology

作　　者：赵智炎 冯昱森 罗子艺 蔡得涛 薛亚飞 王忠强 于颜豪[2] Zhao Zhiyan;Feng Yusen;Luo Ziyi;Cai Detao;Xue Yafei;Wang Zhongqiang;Yu Yanhao(China-Ukraine Institute of Welding,Guangdong Academy of Sciences,Guangdong Provincial Key Laboratory of Advanced Welding Technology,Guangzhou 510650,Guangdong,China;State Key Laboratory of Integrated Optoelectronics,College of Electronic Science and Engineering,Jilin University,Changchun 130012,Jilin,China;Dongguan Institute of Opto-Electronics Peking University,Dongguan 523808,Guangdong,China)

机构地区：[1]广东省科学院中乌焊接研究所,广东省现代焊接技术重点实验室,广东广州510650 [2]吉林大学电子科学与工程学院集成光电子学国家重点实验室,吉林长春130012 [3]北京大学东莞光电研究院,广东东莞523808

出　　处：《中国激光》2024年第16期147-154,共8页Chinese Journal of Lasers

基　　金：广东省基础与应用基础研究基金(2019B1515120081);广东省科学院发展专项资金项目(2023GDASZH-2023010105,2021GDASYL-20210103085);吉林省科技发展计划项目重大科技专项(20220301003GX)。

摘　　要：金刚石作为一种具有独特优异性能的半导体材料,在光学和电子学领域具有重要的应用价值。目前生长金刚石最常用的方法是化学气相沉积(CVD)法,采用该方法制备的金刚石薄膜通常为多晶结构,表面粗糙度高、颗粒大的缺点制约了金刚石薄膜的应用。笔者提出了飞秒-纳秒-离子束刻蚀的复合抛光方法并采用该方法对CVD金刚石薄膜进行抛光。结果表明:经飞秒-纳秒激光刻蚀后,金刚石表面粗糙度降低得十分明显,由未刻蚀时的4μm降至0.5μm左右,但表面出现了明显的石墨化现象;进一步采用离子束刻蚀去除表面的石墨层,最低可将表面粗糙度降至0.47μm。所提方法实现了金刚石表面的无改性平滑抛光,为金刚石表面微纳器件的发展奠定了基础。Objective Diamond is a wide-bandgap semiconductor material with several excellent physical and chemical properties.It has an ultrawide bandgap of 5.5 eV,which is significantly higher than those of GaN,SiC,and other wide-bandgap semiconductor materials.In addition,it has a low dielectric constant,low friction coefficient,high carrier mobility,high electron drift speed,and high thermal conductivity.These unique properties make diamonds have an important application value in optics and microelectronics.Because of the high hardness of diamonds,the traditional mechanical polishing method,which yields low polishing speeds and has high costs,cannot achieve an ideal effect.Ion-beam etching is a highly efficient noncontact surface-polishing method for super-hard and brittle substrates.However,it is unsuitable for industrial production because of its high cost.Laser processing is a noncontact processing technique that can handle curved surfaces.It has high processing efficiency and can achieve high-quality processing of various hard materials.Therefore,laser polishing can be used to polish the diamond film using the high energy of the laser to ablate the edges of the diamond particles.It can reduce the surface roughness and flatten the film,but typically induces a surface microstructure or nanostructure on the film surface and introduces a graphite layer.Although several polishing methods for diamond films have been developed,they have limitations,and it is difficult to satisfy the increasing application requirements.To solve these problems,we propose a composite polishing method that uses laser polishing combined with ion-beam etching.By further optimizing the polishing process parameters,a diamond surface without a modified layer is obtained,and the roughness is reduced.The results of this study provide technical support for diamond micromachining and related microdevice preparation.Methods The research object of this study is a diamond film prepared via chemical vapor deposition(CVD).The CVD diamond film was first prepo

关 键 词：超快激光 金刚石薄膜 激光抛光 离子束刻蚀 粗糙度 

分 类 号：TN249[电子电信—物理电子学]