溅射镀膜单体机真空系统设计及性能分析  

Sputter Coating Unit Vacuum System Design and Pumping Performance

作　　者：许泽宇 胡明[1] 刘杰 顾子莺 赵德明 XU Zeyu;HU Ming;LIU Jie;GU Ziying;ZHAO Deming(Zhejiang Sci-Tech University,Hangzhou 310000,China;Hangna Semiconductor Equipment(Hangzhou)Co.,Ltd.,Hangzhou 310000,China)

机构地区：[1]浙江理工大学,杭州310000 [2]杭纳半导体装备(杭州)有限公司,杭州310000

出　　处：《真空科学与技术学报》2024年第11期1000-1008,共9页Chinese Journal of Vacuum Science and Technology

基　　金：国家重点研发计划项目(2018YFB1308100)。

摘　　要：为了使溅射镀膜单体机的极限真空度达到5×10^(-4)Pa并提高其抽空效率,提出了新的溅射镀膜单体机真空系统设计方案。利用MOLFLOW+软件对所设计的真空系统进行了极限真空度验证,真空室内部气压均优于2.7×10^(-4)Pa;同时,建立了真空系统的抽气计算模型,求解得到抽空曲线,与实机试验结果进行比较,结果显示,计算模型获得的抽空曲线与试验测试值偏差小于5%,可用于高真空系统性能分析。In order to make the ultimate vacuum of the sputter coating unit reach 5×10^(-4) Pa and improve its evacuation efficiency,a new design of the vacuum system of the sputter coating unit is proposed.Based on the MOLFLOW+software,the ultimate vacuum of the designed vacuum system is verified,which is better 2.7×10^(-4) Pathan.A pumping calculation model of the vacuum system of the sputter coating unit is established,and the pumping curves are obtained by solving the model and comparing the results with those of the real machine test,which show that the deviation of the pumping curves obtained by the model from the experimental test values is less than 5%,which can be used for the performance analysis of the high-vacuum system.

关 键 词：磁控溅射 真空系统 抽气性能 抽空曲线 

分 类 号：TB43[一般工业技术] TB79