氩气流量对射频CVD法沉积类金刚石碳薄膜的影响  

Effect of Argon Gas Flow Rates on the Deposition of Diamond-Like Carbon Thin Films by RF-CVD Technology

作　　者：汤黎辉 肖长江[1] 任瑛[1] 张群飞 郑皓宇 栗正新[1] TANG Lihui;XIAO Changjiang;REN Ying;ZHANG Qunfei;ZHENG Haoyu;LI Zhengxin(School of Materials Science and Engineering,Henan University of Technology,ZhengZhou 450001,China)

机构地区：[1]河南工业大学材料科学与工程学院,河南郑州450001

出　　处：《超硬材料工程》2024年第6期11-16,共6页Superhard Material Engineering

基　　金：工信部高质量发展专项(203ZS20230005);河南省重大科技专项高端超硬材料制品关键技术研究及产业化(221100230100)。

摘　　要：文章采用射频CVD沉积法,以甲烷和氢气为反应物,在硅(111)基底上沉积类金刚石碳薄膜,分析不同氩气流量对类金刚石碳薄膜性能的影响。利用激光拉曼光谱仪对类金刚石碳薄膜的结构特征进行分析,发现在1400~1700 cm^(-1)区间,有一个明显的宽G峰,而在1300~1400 cm^(-1)区间,则出现了一个较弱的肩D峰。研究结果表明,当氩气流量为0 ml/min和10 ml/min时制备的薄膜,符合类金刚石碳薄膜的典型特征;并且随着氩气浓度的增大,可以促进类金刚石碳的生长、抑制杂质的生成以及减少类金刚石碳中的含氢量。当氩气浓度增大到一定值后,则开始抑制类金刚石碳的生长,直至无法长出类金刚石碳膜。当氩气流量为10 ml/min时,获得的类金刚石碳薄膜是最好的。The article used RF-CVD deposition method to deposit diamond-like carbon films on silicon(111)substrate with methane and hydrogen as reactants,and analyzed the effect of different argon gas flow rates on the properties of diamond-like carbon films.Using a laser Raman spectrometer to analyze the structural characteristics of diamond-like carbon films,it was found that there is a clear broad G peak in the range of 1400~1700 cm^(-1),while a weak shoulder D peak appears in the range of 1300~1400 cm^(-1).It was shown that the films prepared when the argon flow rate was 0 ml/min and 10 ml/min were in accordance with the typical characteristics of diamond-like carbon films;and with the increase of argon concentration,the growth of diamond-like carbon,the inhibition of impurity generation,and the reduction of hydrogen content in diamond-like carbon could be promoted.When the argon concentration increased to a certain value,it began to inhibit the growth of diamond-like carbon,until the diamond-like carbon could not be grown.The best diamond-like carbon films were obtained when the argon flow rate was 10 ml/min.

关 键 词：等离子增强化学气相沉积 类金刚石碳膜 拉曼光谱 

分 类 号：TQ164[化学工程—高温制品工业]