氮化镍薄膜的制备及应用  

Preparation and Application of Nickel Nitride Thin Film

作　　者：方弘历 任家轩 严建军 刘博文 桑利军[1] 刘忠伟[1] FANG Hong-li;REN Jia-xuan;YAN Jian-jun;LIU Bo-wen;SANG Li-jun;LIU Zhong-wei(Laboratory of Plasma Physics and Materials,Beijing Institute of Graphic Communication,Beijing 102600,China)

机构地区：[1]北京印刷学院等离子体物理及材料研究室,北京102600

出　　处：《印刷与数字媒体技术研究》2025年第1期1-13,27,共14页Printing and Digital Media Technology Study

基　　金：国家自然科学基金面上项目(No.12475255);北京印刷学院校级项目(No.Eb202401)。

摘　　要：氮化镍薄膜是一种具有良好导电性和化学稳定性的功能材料,在催化、电化学储能、传感器等领域具有广泛的应用前景。制备氮化镍薄膜的方法主要包括物理气相沉积法(PVD)、化学气相沉积法(CVD)、溶液凝胶法(Sol-Gel)以及热分解法等。氮化镍薄膜表现出优异的电催化性能,尤其在氢气析出反应(HER)和氧气还原反应(ORR)中表现突出。此外,氮化镍薄膜还可以作为超级电容器的电极材料,提供高的比电容和强的循环稳定性。同时,氮化镍薄膜的导电性和磁性使其在传感器和磁性存储器件中也具有潜在应用。本文介绍了氮化镍薄膜制备工艺的研究进展,探讨了氮化镍薄膜在能源和电催化领域中的应用,为氮化镍薄膜的制备与发展提供了参考。Nickel nitride film has a wide application prospect in catalysis,electrochemical energy storage,sensors and other fields due to their good electrical conductivity and chemical stability.The traditional preparation methods of nickel nitride film mainly include physical vapor deposition(PVD),chemical vapor deposition(CVD),solution gel method(Sol-Gel)and thermal decomposition method.Nickel nitride film shows excellent electrocatalytic properties,especially in hydrogen precipitation reaction(HER)and oxygen reduction reaction(ORR).In addition,nickel nitride film can also be used as electrode materials for supercapacitors,providing high specific capacitance and long cycle stability.At the same time,the conductivity and magnetic properties of nickel nitride film makes them also potential applications in sensors and magnetic memory devices.In this paper,the research progress of deposition of nickel nitride thin film was introduced,and the application of nickel nitride thin film in energy and electrocatalysis fields was summarized.It provides a reference for the preparation and development of nickel nitride thin film.

关 键 词：氮化镍 化学气相沉积 物理气相沉积 

分 类 号：TB383[一般工业技术—材料科学与工程]