旋转批靶离子注入机靶室晶圆传送系统设计  

Design of the Wafer Transfer System in the Target Chamber of Disk Batch Target Ion Implanters

作　　者：郭锐利 彭立波 罗才旺 GUO Ruili;PENG Libo;LUO Caiwang(Changsha Branch of Beijing Semicore ZKX Electronic Equipment Co.,Ltd.,Changsha 410014,China)

机构地区：[1]北京烁科中科信电子装备有限公司长沙分公司,湖南长沙410014

出　　处：《电子工业专用设备》2025年第1期28-32,54,共6页Equipment for Electronic Products Manufacturing

摘　　要：为满足旋转批靶离子注入机的自动化需求,设计了旋转批靶离子注入机的靶室晶圆传送系统,介绍了靶室结构和晶圆传送流程、片库腔体、机械手腔体和靶室腔体;分析了3种传片流程,并进行比较;论述了靶室运动控制系统及硬件和软件设计思路。最后对靶室晶圆传送系统进行总结,并展示其研制成功后的应用成果,可交付给芯片厂进行批量生产。In order to meet the need of automation of a disk batch target ion implanter,this paper mainly introduces a wafer transfer system in the target chamber of a disk batch target ion implanter,which shows the target chamber structure and wafer transfer progress,including the introduction of loadlock chamber,robot chamber and target chamber,as well as the analysis of three progresses,i.e.,from loadlock to target disk,from target disk to loadlock and cross transfer progress,and make comparison among them.Moreover,it illustrates the hardware of the system,introduces software and hardware design.Finally,it draws a conclusion to the wafer transfer system in the target chamber of a disk batch target ion implanter,and shows the achievements of the successful application of the system,which could be implemented to Fabs.

关 键 词：离子注入机 晶圆传送系统 真空机械手 靶室 运动控制 

分 类 号：TN305.3[电子电信—物理电子学]