超大数值孔径深紫外投影光刻空间像的偏振响应分析  

Analysis of the Polarization Response of Aerial Images in Deep Ultraviolet Projection Lithography with Ultra-High Numerical Aperture

作　　者：彭仁举 PENG Renju(School of Electrical and Electronic Engineering,Chengdu Technological University,Chengdu 611730,China)

机构地区：[1]成都工业学院电子工程学院,成都611730

出　　处：《成都工业学院学报》2025年第2期14-19,共6页Journal of Chengdu Technological University

基　　金：成都工业学院科研项目(2024RC017)。

摘　　要：65 nm以下工艺节点的投影物镜具有超大数值孔径,且处于深紫外工作波段,导致不同偏振态所对应的投影光刻空间像之间存在显著的差异。将s和p偏振所对应空间像之间的差异定义为偏振响应,以十字线和竖线条阵列为研究对象,利用矢量衍射投影光刻成像模型分析了6种典型照明工况所对应的偏振响应。结果表明,对于传统照明模式,当数值孔径为0.15时偏振响应最强,而离轴照明模式的偏振响应与掩模板的图案紧密相关。上述分析结果有助于指导超大数值孔径投影光刻的设计以及曝光工艺参数的选择,从而进一步提升投影光刻的良率。The projection lithography objective for process nodes below 65 nm features an ultra-high numerical aperture(NA)and operates in the deep ultraviolet(DUV)spectrum.Consequently,significant differences arise in the spatial imaging of projection lithography due to the polarization state of the illumination light.Notably,spatial images formed by s-polarized and p-polarized illumination exhibit substantial disparities.The polarization response was defined as the difference between the spatial images corresponding to s-polarization and p-polarization.Using a vector diffraction imaging model for projection lithography,the polarization response of cross and vertical line arrays under six typical illumination conditions was investigated in this study.The pupil plane distribution of the polarization response was calculated and analyzed.The results indicate that for conventional illumination,the polarization response is strongest when the numerical aperture is 0.15.For off-axis illumination,the polarization response is closely related to the pattern of the photo-mask.These findings provide valuable insights for the design of ultra-high NA projection lithography systems and the selection of exposure process parameters,ultimately enhancing the yield of projection lithography.

关 键 词：偏振响应 超大数值孔径 深紫外 投影光刻 

分 类 号：TP311.13[自动化与计算机技术—计算机软件与理论]