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作 者:张真超 金岩[1] 冯柏成[1] ZHANG Zhenchao;JIN Yan;FENG Baicheng(College of Chemical Engineering,Qingdao University of Science and Technology,Qingdao 266042,China)
出 处:《青岛科技大学学报(自然科学版)》2025年第2期38-45,共8页Journal of Qingdao University of Science and Technology:Natural Science Edition
基 金:山东省自然科学基金项目(ZR2020MB132).
摘 要:以噻蒽和三氟甲烷磺酸酐为原料,合成了一种新型的硫鎓盐类光致产酸剂5-三氟甲基-噻蒽三氟甲磺酸盐,并通过^(1)H NMR、^(13)C NMR、^(19)F NMR和熔点对产品结构进行了表征。对该光致产酸剂的溶解性、热稳定性、紫外吸收、分解和产酸量子产率进行评测,结果表明该产酸剂在各常用涂布溶剂中溶解度均较好,更易溶于极性溶剂,2%质量分数的分解温度超过了150℃,在193、248和365 nm的处的ε值均较高,分解和产酸量子产率分别可达0.34和0.32。各项性能与主流365 nm产酸剂N-羟基-1,8-萘酰亚胺三氟甲磺酸盐相比,该新型硫鎓盐类光致产酸剂的整体性能更为优秀,对光子的利用和转化能力更高,是少有的能够在300 nm以上波长下应用的鎓盐类产酸剂,且具备转化为其他新型产酸剂的巨大潜力,是一款性能优异、应用广泛的光致产酸剂,在光刻胶领域具有较高的开发和应用价值。A new type of sulfonium salt photoacid-producing agent 5-trifluoromethyl-thiaanthracene trifluoromethanesulfonate was synthesized from thioanthracene and trifluoromethanesulfonic anhydride.The structure of the product was characterized by 1H NMR,13C NMR,19F NMR and melting point.Then the solubility,thermal stability,UV absorption,decomposition and acid production quantum yield of the photo-acidogen were evaluated.The results showed that the solubility of the photo-acidogen in various commonly used coating solvents was better,and it was more soluble in polar solvents.The decomposition temperature of 2%was more than 150,and theεvalue at 193,248 and 365 nm is higher,the quantum yields of decomposition and acid production are 0.34 and 0.32 respectively.Finally,compared with the mainstream 365nm acid producing agent N-hydroxy-1,8-naphthalimide trifluoromethanesulfonate,the overall performance of the new sulfonium salt photoacid-producing agent is more excellent,and the ability to use and transform photons is higher.It is a rare onium salt acid-producing agent that can be used at wavelengths above 300 nm,and has great potential to convert into other new acid-producing agents.It is a photoacid-producing agent with excellent performance and wide application,It has high development and application value in the field of photoresist.
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