原子束全息技术制作任意微细图形研究  

Study on Making Random Micro-pattern by Atom Hologram

作　　者：石建平[1] 陈旭南[1] 高洪涛[1] 陈献忠[1] 罗先刚[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,成都610209

出　　处：《微细加工技术》2002年第3期48-51,共4页Microfabrication Technology

基　　金：中国科学院创新基金资助项目 (A2K0 0 0 )

摘　　要：从波粒二象性原理出发 ,研究了用氖原子束计算全息技术制作任意纳米结构的基本原理和方法 ,克服了用激光梯度场控制原子堆积 ,只能制作单一点、线等周期性纳米结构的不足。分析讨论了原子全息与光学全息的区别 ,指出只有经激光冷却的原子束才满足全息技术所要求的相干条件和衍射条件。最后采用罗曼Ⅲ型迂回位相编码方法设计了氖原子束计算全息片 。Based on theory of wave particle duality,the principal and method about making random nano-pattern by Ne atom hologram are studied. This technology can make up the disadvantage of only being able to make the periodic nano-pattern such as the single line or dot etc.when using laser gradient field to control atoms' movement to accumulate on the silicon slice.Analyzing the difference of atom hologram and optical hologram, we point out that only the laser cooling atoms can satisfy the coherent and diffract conditions required by the hologram technology. A piece of Ne atom computer generated hologram (CGH) with Lohmann Ⅲ coding is designed and a experiment system of making random nano-pattern by controlling Ne atom beam is presented.

关 键 词：任意微细图形 纳米结构制作 计算全息 原子全息 激光冷却 

分 类 号：TB383[一般工业技术—材料科学与工程] TN305.[电子电信—物理电子学]