W/Mo纳米多层膜的界面结构与超硬效应  

A Study on the Interface Microstructure and Superhardness Effect of W/Mo Multilayer

作　　者：李戈扬[1] 韩增虎[1] 田家万[1] 张流强[1] 顾明元[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《稀有金属材料与工程》2003年第1期1-4,共4页Rare Metal Materials and Engineering

摘　　要：研究了W/Mo纳米多层膜的微结构及超硬效应。W/Mo纳米多层膜采用磁控溅射技术制备,并采用XRD、TEM和显微硬度计研究了薄膜的微结构和硬度。结果表明,W/Mo纳米多层膜形成多晶外延生长的超晶格结构;界面共格畸变使W,Mo两调制层的晶面间距随调制周期的减小而相互接近,在多层膜中形成交变应力场,从而使薄膜得到强化。The interface microstructure and superhardness effect of W/Mo nano - multilayers have been studied. The W/Mo multilayers were synthesized with magnetron sputtering technique and their microstructure and hardness were characterized by XRD, TEM, HREM, and microindenter, respectively. The results show that the W/Mo multilayers have a epitaxially grown mode and got polycrystal superlattices. With the decrease of modulation period of multilayers, the interplanar distances of W and Mo layers are close to each other resulting from coherent strain on the interface, which produces an alternating stress field and strengthens multilayers.

关 键 词：W/Mo纳米多层膜 界面结构 超晶格 超硬效应 

分 类 号：O484.4[理学—固体物理]