亚稳态氖原子光刻的实验研究  

Experimental Study on Metastable-neon Atom Lithography

作　　者：霍芸生[1] 蔡惟泉[1] 曾庆林[1] 鄢和明[1] 王育竹[1] 

机构地区：[1]中国科学院上海光学精密机械研究所量子光学开放实验室,上海201800

出　　处：《中国激光》2003年第1期22-24,共3页Chinese Journal of Lasers

基　　金：国家自然科学基金 (No .19774 0 6 0 )资助项目

摘　　要：用亚稳态氖原子束进行了原子光刻实验。用栅网作掩膜 ,以扩散泵油的有机分子在高能亚稳态氖原子作用下所生成的碳膜作抗蚀剂 ,在硅片上刻蚀出分辨率为 2 μm的微结构 ,为进一步的纳米级原子光刻技术的研究打下了基础。The atomic-lithography experiments were carried out by use of a metastable neon atomic beam. Metallic meshes were used as masks, and the carbon films were produced from the organic molecules of diffusion-pump oil, which were adsorbed on the surface of wafers and exposed to the high energy metastable neon atomic beams. The microstructures on the silicon wafers with the resolution of microns were obtained. The lithography resolution reaches 2 nm.

关 键 词：原子光刻 亚稳态氖原子束 惰性气体 微结构 

分 类 号：TN305.7[电子电信—物理电子学]