紫外写入法制作阵列波导光栅  

Investigation on Arrayed Waveguide Grating Fabricated by Ultra-violet Writing

作　　者：吴远大[1] 张乐天[1] 邢华[1] 李爱武[1] 郑伟[1] 刘国范[1] 张玉书[1] 

机构地区：[1]吉林大学光电子国家重点实验室,吉林长春130023

出　　处：《半导体光电》2003年第1期37-40,共4页Semiconductor Optoelectronics

基　　金：国家973计划资助项目(TG2000036602)

摘　　要：　提出了一种可能代替传统的利用反应离子刻蚀法(RIE)来制作阵列波导光栅(AWG)的新方法———紫外写入法。对紫外写入法制作AWG的可行性和优缺点进行了分析,设计了AWG的基本参数,并对整个工艺流程进行了设计和优化。最后,报道了本实验组获得的紫外诱导折射率变化值以及用紫外写入法制作的条形波导阵列。A new technique called UVwriting is proposed for fabrication of arrayed waveguide grating, instead of using the conventional reactive ion etching method. The feasibility of the technique is analyzed and the main parameters of AWG written by ultraviolet laser pulses are worked out. The technological process has been designed and optimized as well. In our recent experiments, relatively large refractive index change was obtained and waveguide array was successfully fabricated by UV writing.

关 键 词：紫外写入 阵列波导光栅 火焰水解法 AWG 波分复用 

分 类 号：TN253[电子电信—物理电子学] TN304.05