从SEMICON/WEST′91看当今光刻设备的发展(出国参观考察报告)  

A Comment for Present Lithography Equipment Development from the SEMICON/WEST′91 Exhibition

作　　者：姚汉民[1] 黄泽永[1] 谢传钵[1] 陈旭南[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《光电工程》1992年第3期52-64,共13页Opto-Electronic Engineering

摘　　要：本文介绍了参加SEMICON/WEST′91展览会所见到的国外光刻设备——新研制的制造亚微米器件(16Mb)用的半导体设备已面市。特别引人注目的是许多公司已推出它们的新型光刻设备——0.5～0.8μm硅片分布重复光刻机,如ASM公司的PAS-5500型,Ultratech公司的Ultrastep-2000型,GCA公司的XLS-7000系列,Canon公司的FPA-2000il型,Nikon公司的NSR2005G8i/i8A型依靠i线光刻的分步重复光刻机及用于生产64Mb及256Mb DRAM的有效使用准分子激光器深紫外光刻机的市场可望连续增长。The new lithography equipment-recent developed semiconductorequipment for sub-micron devices (16 Mb), which we saw in SEMICON/WEST′91 Exhibition, are introduced in the paper. The special noticeableequipment are 0.5~0.8μm DSW, such as PAS-5500 of ASM Lithography,Ultrastep-2000 of Ultratech Stepper,XLS-7000 series of GCA, FPA-2000il ofCanon USA,Inc,NSR 2005 G8i/i8A of Nikon Precision.The markets of DSWrelying on i-line lithography and steppers applying to producing 64 Mb and256 Mb DRAM by effectively using excimer laser deep UV would contin-uously grow.

关 键 词：展览会 发展 光刻机 

分 类 号：TN305.7[电子电信—物理电子学]