利用(110)硅片制作微反射镜  

Fabrication of micro-mirror in (110) silicon

作　　者：张龙[1] 董玮[1] 刘彩霞[1] 张歆东[1] 陈维友[1] 徐宝琨[1] ZHANG Long;DONG Wei;LIU Cai—xia;ZHANG Xin—dong;CHEN Wei—you;XU Bao—kun(State Key Laboratory on Integrated Opto—electronics,Jilin University Region,Changchun 130023,China)

机构地区：[1]吉林大学集成光电子国家重点联合实验室,吉林长春130023

出　　处：《吉林大学学报(信息科学版)》2003年第2期97-99,共3页Journal of Jilin University(Information Science Edition)

基　　金：国家863计划资助项目(2002AA312023);国家自然科学基金资助项目(69937010);吉林省科学计划资助项目(20010319);跨世纪优秀人才培养计划基金资助项目(200248)

摘　　要：采用体硅微机械加工方法,通过光刻、反应离子刻蚀和氢氧化钾水溶液湿法刻蚀等工艺,根据(110)硅片结晶学原理,在(110)硅片上制作出微反射镜。微反射镜的镜面为{111}晶面,利用扇形定位区域,精确地沿(110)硅片的{111}晶面进行定向腐蚀,可使微反射镜镜面垂直度达到90°±1°,表面粗糙度经测量低于6nm,在上面蒸金后其反射率可达95%。The micromirror on(110)silicon can be mode using bulk-silicon micro-mechanical technology.In the process of fabricating the device,photolithograph y technology and reaction ion etching technology and wet-etching technology wer e used.With advanced etching sector or ientation structure on(110)silicon,we can accurately etch along the{111}sid es of silicon in KOH solution.So the perfect mirror is got,and its surface ro ughness is lower than 6nm,and its perpendicularity is 90°±1°.After evaporati ng a layer of gold membrane on it,its reflectivity is 95%.

关 键 词：微反射镜 {111}晶面 刻蚀 

分 类 号：TN25[电子电信—物理电子学] TN929.11