镜面起伏对1.55μm Si基MEMS光滤波器的影响  

The Effect of Mirror Undulation on Optical Property of Si-base MEMS Optical Tunable Filter

作　　者：左玉华[1] 毛容伟[1] 黄昌俊[1] 蔡晓[1] 李传波[1] 成步文[1] 罗丽萍[1] 高俊华[1] 白云霞[1] 姜磊[1] 马朝华[1] 王良臣[1] 余金中[1] 王启明[1] 

机构地区：[1]中国科学院半导体研究所集成光电子国家重点实验室,北京100083

出　　处：《光子学报》2003年第6期661-664,共4页Acta Photonica Sinica

基　　金：国家重点基础研究发展规划(973项目)G2 0 0 0 0 36 6 0 3;自然科学基金重大课题 (No .96 10 4 0 0 3);863项目2 0 0 2AA312 0 10资助项目

摘　　要：用传输矩阵方法 ,在简化的光学模型基础上 ,分别讨论了分布式Bragg反射镜DBR(DistributedBraggReflector)的生长精度及镜面起伏对 1.5 5 μmSi基MEMS (Micro Electro Mechanical System)可调谐光滤波器透射谱的影响 计算表明 :DBR生长误差仅使主透射峰位置发生变化 ,而镜面起伏是导致主透射峰性能劣化的主要原因 ,它使得FWHM增大 ,透射峰强度下降 理论计算结果能较好地解释实验现像 在此基础上 ,进一步讨论了引起镜面起伏的多种原因 。The prototype 1.55 μm Si based MEMS tunable optical filter was fabricated,using surface micromachined technology. Based on the Gaussian model of the filter cavity, the effect of the deviation in the mirror fabrication and the cavity length on the static optical property of the filter has been investigated,using transfer matrix method. It is found that the deviation of the mirror thickness affect the position of the transmittance peak,and has no effect on its FWHM and intensity; by contrast, the cavity length undulation has great influence on the quality of the main transmittance peak, widening its FWHM and decreasing its intensity. The model can explain the experimental transmittance curve quite well. The possible problems in the fabrication process have been discussed and potential ways to relieve the mirror undulation offered.

关 键 词：光学模型 MEMS光滤波器 可调谐光滤波器 透射谱 DBR 镜面起伏 滤波特性 DWDM 密集波分复用系统 光通信 

分 类 号：TN713[电子电信—电路与系统] TN929.1